Magnetic Field-Guided Deposition for Patterned Electrochromic Layers

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Solution Overview

Problem

Conventional electrochromic devices suffer from poor reliability and environmentally unfavorable manufacturing processes, particularly due to high costs and chemical waste generation in photolithography techniques used for fabricating patterned layers.

Innovation Solution

A method involving a substrate with a magnetic element positioned to create a magnetic field, allowing charged particles to be deposited onto the substrate surface in a controlled manner, forming patterned layers with varying thicknesses, which are then used to manufacture electrochromic devices with enhanced reliability and reduced environmental impact.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If photolithography techniques are used to fabricate patterned layers, then manufacturing precision is improved, but manufacturing cost increases and chemical waste is generated

Engineering Contradiction:

Improvepatterned layer fabrication precisionVSAvoidmanufacturing cost and environmental impact

Core Design Contradiction:

Manufacturing precisionVSEase of manufacture

Solution Approach 1:

The patent extracts and removes the photolithography process from the manufacturing sequence, replacing it with direct magnetic field-guided deposition. This eliminates the need for photoresist materials, development solutions, and etching chemicals, thereby removing the source of chemical waste while maintaining patterned layer fabrication capability

Inventive Principle:

Principle #2Taking out (Extraction)

Solution Approach 2:

The patent replaces the chemical-based photolithography system with a magnetic field-based deposition system. By using magnetic elements to guide charged particles directly to form patterns, the process substitutes chemical reactions with magnetic field control, eliminating harmful chemicals while achieving precise patterning

Inventive Principle:

Principle #28Mechanics substitution (Replace mechanical system)

2Manufacturing precision

If conventional photolithography processes are used, then patterned layers can be formed, but chemical waste such as stripped photoresist and etchant solution is produced

Engineering Contradiction:

Improvepatterned layer formationVSAvoidchemical waste generation

Core Design Contradiction:

Manufacturing precisionVSObject-generated harmful factors

Solution Approach 1:

The patent converts the potentially harmful charged particles into a beneficial deposition tool. By controlling charged particles through magnetic fields, the process achieves precise material deposition without generating chemical waste, transforming a potentially dangerous element into an environmentally friendly manufacturing approach

Inventive Principle:

Principle #22Blessing in disguise (Convert harm into benefit)

Solution Approach 2:

The patent extracts and eliminates all chemical waste-generating steps from the process. By using direct magnetic field-guided deposition, the method removes photoresist stripping, development, and etching operations, thereby eliminating the generation of chemical waste while maintaining patterned layer formation capability

Inventive Principle:

Principle #2Taking out (Extraction)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The method improves the reliability and reduces environmental harm by creating patterned layers with controlled thickness and surface patterns, enhancing the electrochromic device's performance and manufacturing efficiency while minimizing waste.

Implementation Method 1

providing a magnetic element, wherein the second surface is arranged between the magnetic element and the first surface; and depositing the charged particles on the first surface by utilizing the magnetic element

Methodology Applied

Scientific EffectMagnetic field: Magnetic Field

Implementation Method 2

depositing the charged particles on the first surface by utilizing the magnetic element

Methodology Applied

Scientific EffectLorentz force: Lorentz Force

Implementation Method 3

depositing the charged particles on the first surface by utilizing the magnetic element, and thereby forming a patterned layer

Methodology Applied

Scientific EffectPhysical vapor deposition: Physical Vapour Deposition

Data Source

PatentUS9423663B2Method for manufacturing patterned layer and method for manufacturing electrochromic device

Publication Date: 2016.08.23 AU OPTRONICS CORP

AI summary

A method for manufacturing a patterned layer includes the steps of: providing a substrate having a first surface and a second surface opposite to the first surface; providing a material source for supplying a plurality of charged particles, in which the first surface faces the material source; providing a magnetic element, in which the second surface is arranged between the magnetic element and the first surface; and depositing the charged particles on the first surface through using the magnetic element so as to form a patterned layer. A method for manufacturing an electrochromic device is disclosed as well.