Magnetic Guiding Structures for Multi-Angle Slanted Trench Etching
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Solution Overview
Problem
Current nanofabrication techniques struggle to produce slanted trench features at varied angles and orientations on a substrate, particularly for augmented reality displays, due to limitations in etching technologies like RIBE, which can only form features at a single angle and direction, and suffer from redeposition issues.
Innovation Solution
Incorporating magnetic guiding structures within the substrate to alter the direction of etching processes, allowing for the simultaneous formation of slanted trench features at different angles and orientations by manipulating magnetic field strength and placement.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If reactive ion beam etching (RIBE) is used to form slanted trenches, then slanted features can be produced, but only at a single angle and in a single direction
Solution Approach 1:
Magnetic guiding structures are introduced as intermediary elements to control the direction of etching ions. These magnetic structures mediate between the etching process and the substrate, enabling varied trench angles without changing the fundamental RIBE process parameters. The magnetic fields generated by these structures guide the ion bombardment direction, allowing formation of slanted trenches at multiple angles and orientations using a single etching tool configuration.
Solution Approach 2:
The invention changes the magnetic field parameters (strength, direction, distribution) to control the etching process. By adjusting the magnetic guiding structure configuration, different magnetic field patterns are created, which in turn produce trenches at different angles. This allows a single etching process to generate varied trench geometries by simply changing the magnetic field parameters rather than reconfiguring the entire etching system.
2Adaptability or versatility
If multiple etching processes are used to form trenches at different angles, then angle variety is achieved, but manufacturing time and complexity increase
Solution Approach 1:
The invention merges multiple etching operations into a single unified process by integrating magnetic guiding structures that can generate multiple magnetic field patterns. Instead of performing separate etching steps for different trench angles, the magnetic guiding structures enable all angle variations to be achieved in one continuous etching process, thereby combining what would otherwise require multiple sequential operations.
Solution Approach 2:
The magnetic guiding structures serve multiple functions: they guide ions for vertical trenches, slanted trenches at various angles, and trenches with different orientations. This multi-functional capability allows a single etching process to replace what would traditionally require multiple specialized etching steps, improving manufacturing efficiency while maintaining trench angle variety.
3Reliability
If slanted gratings are used for light coupling, then coupling efficiency is improved, but fabrication complexity increases due to high etch selectivity requirements
Solution Approach 1:
Magnetic guiding structures act as intermediaries that simplify the fabrication of slanted gratings. By controlling the ion direction through magnetic fields, the etching process can directly form the required slanted profiles without needing complex multi-step processes or high etch selectivity between different materials. The magnetic field mediates the etching action to produce the desired slanted grating geometry more directly.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables the production of angled trench features suitable for nanoimprint lithography and optical waveguides, enhancing manufacturing efficiency and precision in augmented reality devices.
Implementation Method 1
two or more magnetic guiding structures embedded within the first region of the substrate for generating a magnetic field near the plurality of first slanted trench features
Data Source
AI summary
A semiconductor structure includes a first plurality of slanted features within a first region of a substrate. Two or more magnetic guiding structures are embedded within the first region of the substrate. The first plurality of slanted features is located between the two or more magnetic guiding structures for varying a magnetic field strength around the first plurality of slanted features. A second plurality of slanted features are located within a second region of the substrate. The second region of the substrate is adjacent to the first region of the substrate. The second plurality of slanted features include a second orientation angle that is different from a first orientation angle of the first plurality of slanted features.