Magnetic Head Pole Layer Alignment via Segmented Etching Masks
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Solution Overview
Problem
Existing magnetic heads for perpendicular magnetic recording systems face challenges in accurately aligning and controlling the shapes of the pole layer and side shields, leading to issues with adjacent track erasing and write characteristics due to flux leakage and skew.
Innovation Solution
A manufacturing method that involves forming grooves in a nonmagnetic layer using etching masks to accurately position and shape the pole layer and side shields, allowing for precise alignment and independent control of their shapes, thereby improving write characteristics and reducing adjacent track erasing.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of manufacture
If a single etching mask is used to form grooves for the pole layer and side shields simultaneously, then the manufacturing process is simplified, but the alignment precision and shape control of the pole layer and side shields deteriorate
Solution Approach 1:
The patent divides the etching mask formation into separate steps: first forming a preliminary mask with all groove patterns, then selectively removing portions to create final masks for different grooves. This segmentation allows independent control of each groove's shape and position while maintaining overall process organization.
Solution Approach 2:
The patent performs preliminary etching to form grooves for the side shields before forming the groove for the pole layer. This preliminary action establishes reference positions that guide subsequent etching steps, ensuring accurate alignment without requiring complex simultaneous masking.
2Manufacturing precision
If the pole layer and side shields are formed with different masks, then the alignment precision is improved, but the device complexity increases
Solution Approach 1:
The patent segments the mask structure into a preliminary mask containing all groove patterns and subsequent selective removal steps. This creates multiple simpler masks rather than one complex mask, reducing overall device complexity while maintaining precision.
Solution Approach 2:
The preliminary etching step creates reference grooves that simplify subsequent masking operations. By establishing these references first, the patent reduces the complexity of aligning and forming the remaining grooves with different masks.
3Reliability
If the shape of the pole layer and side shields is controlled independently, then the write characteristics are improved, but the manufacturing precision requirements increase
Solution Approach 1:
The patent segments the groove formation into independent etching steps for different grooves, allowing each groove's shape to be controlled separately through selective masking and etching parameters. This enables independent optimization of pole layer and side shield shapes.
Solution Approach 2:
The patent applies different etching conditions and masking strategies to different groove locations. By tailoring the etching process to each specific groove's requirements, the patent achieves local shape optimization that improves overall write characteristics while managing precision requirements through localized control.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The method enables accurate alignment and shaping of the pole layer and side shields, enhancing write characteristics and suppressing adjacent track erasing, leading to improved recording density and reliability.
Implementation Method 1
forming an etching mask layer on the nonmagnetic layer, the etching mask layer having a first opening, a second opening and a third opening that have shapes corresponding to respective planar shapes of the first, second and third grooves to be formed later
Implementation Method 2
forming the first to third grooves in the nonmagnetic layer by etching using the etching mask layer
Data Source
AI summary
A magnetic head includes a pole layer, first and second side shields, and an encasing layer having first to third grooves that accommodate the pole layer and the first and second side shields. A manufacturing method for the magnetic head includes the step of forming the first to third grooves in a nonmagnetic layer by using an etching mask layer having first to third openings. This step includes the steps of forming the first groove by etching the nonmagnetic layer using the first opening, with the second and third openings covered with a first mask; and forming the second and third grooves by etching the nonmagnetic layer using the second and third openings, with the first opening covered with a second mask.