Magnetic Shadow Mask for Thin Film Resistor Deposition

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Solution Overview

Problem

Conventional methods for manufacturing thin film chip resistor devices involve toxic developers and high equipment and maintenance costs, as well as environmental pollution due to chemical mask removal and deformation issues in screen printing techniques.

Innovation Solution

A method using magnetic shadow masks that detachably and fixedly contact a substrate via attractive magnetic forces to deposit resistor units with precise electrode and resistor elements, reducing the need for toxic chemicals and minimizing environmental impact.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If photolithography with patterned photoresist is used to manufacture thin film chip resistor devices, then manufacturing precision of resistor patterns is improved, but environmental pollution and safety hazards increase due to toxic developers

Engineering Contradiction:
Improveresistor pattern precisionVSAvoidtoxic developer harm
Core Design Contradiction:
Manufacturing precisionVSObject-affected harmful factors

Solution Approach 1:

The patent extracts and removes the photoresist development step from the manufacturing process by using a magnetic shadow mask technique. The magnetic mask directly defines the resistor pattern during deposition without requiring chemical developers, thereby eliminating toxic waste while maintaining pattern precision.

Inventive Principle:
Principle #2Taking out (Extraction)

Solution Approach 2:

The patent replaces the chemical-based photolithography system with a magnetic field-based shadow mask system. The magnetic shadow mask uses magnetic field interaction to define patterns during sputtering deposition, substituting chemical development with a physical field-based approach that avoids toxic substances.

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

2Ease of manufacture

If screen printing techniques are used to form masks for resistor deposition, then ease of manufacture is improved, but manufacturing precision deteriorates due to mask deformation causing resistor value shift

Engineering Contradiction:
Improvemask fabrication easeVSAvoidresistor value precision
Core Design Contradiction:
Ease of manufactureVSManufacturing precision

Solution Approach 1:

The patent changes the material parameter of the mask from screen printing paste to magnetic material that can be magnetically attached. This parameter change allows the mask to be formed without deformation-prone screen printing while maintaining positional stability during deposition, thereby preserving resistor value precision.

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The patent uses a composite approach by combining a magnetic shadow mask with a magnetic fixing member. This composite magnetic system provides both ease of attachment and dimensional stability, preventing the mask deformation issues inherent in screen printing while maintaining manufacturing simplicity.

Inventive Principle:
Principle #40Composite materials

3Ease of manufacture

If screen printing masks are used for resistor deposition, then ease of manufacture is improved, but environmental pollution increases due to chemical mask removal

Engineering Contradiction:
Improvemask application easeVSAvoidchemical pollution
Core Design Contradiction:
Ease of manufactureVSObject-generated harmful factors

Solution Approach 1:

The patent extracts and eliminates the chemical mask removal step by using a magnetic shadow mask that can be easily detached using a magnetic fixing member. The mask is removed physically through magnetic field manipulation rather than chemical dissolution, thereby eliminating chemical pollution while maintaining ease of mask handling.

Inventive Principle:
Principle #2Taking out (Extraction)

Solution Approach 2:

The patent replaces the chemical-based mask removal process with a magnetic field-based detachment process. The magnetic shadow mask is attached and removed using magnetic forces between the magnetic fixing member and the magnetic mask, substituting chemical etching with a clean physical process that generates no harmful waste.

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This method enables the precise formation of resistor units with reduced environmental harm and lower costs by eliminating the need for toxic developers and chemical mask removal, while maintaining accurate resistor values.

Implementation Method 1

the magnetic shadow mask detachably and fixedly contacts the second surface of the substrate by virtue of an attractive magnetic force between the magnetic fixing member and the magnetic shadow mask

Methodology Applied
Scientific EffectMagnetic force: Magnetism

Implementation Method 2

depositing at least one resistor unit on the second surface of the substrate with the use of the magnetic shadow mask

Methodology Applied
Scientific EffectPhysical vapor deposition: Physical Vapour Deposition

Data Source

PatentUS9991032B2Method for manufacturing thin film chip resistor device
Publication Date: 2018.06.05 RALEC ELECTRONICS
  • US9991032B2 patent drawing
  • US9991032B2 patent drawing
  • US9991032B2 patent drawing

AI summary

A method for manufacturing a thin film chip resistor device includes the steps of: disposing a magnetic fixing member on a first surface of a substrate, and disposing a magnetic shadow mask on a second surface of the substrate opposite to the first surface, such that the magnetic shadow mask detachably and fixedly contacts the second surface of the substrate by virtue of an attractive magnetic force between the magnetic fixing member and the magnetic shadow mask; and depositing at least one resistor unit on the second surface of the substrate with the use of the magnetic shadow mask, the resistor unit including two separated first electrode elements and a resistor element that electrically interconnects the first electrode elements.