Magnetic Support for EUV Imaging Device Creep Compensation
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Solution Overview
Problem
In microlithographic optical systems, especially those operating in the extreme ultraviolet (EUV) range, conventional refractive systems face challenges due to high material absorbance, necessitating the use of reflective systems with high numerical aperture, which requires precise positioning and orientation of optical elements to maintain imaging accuracy over time, but is complicated by creep and settling effects in supporting structures, leading to costly and complex designs to compensate for these changes.
Innovation Solution
A magnetic device is introduced to act kinematically parallel to supporting spring devices between load-bearing structures, exerting a magnetic supporting force that counteracts changes in the relative situation between supporting structures, reducing creep and settling effects, and allowing for passive or active compensation to maintain initial alignment, thereby minimizing the need for large motion reserves in the situation control device.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Stability of the object's composition
If supporting spring devices are used to support the measuring device, then vibration isolation is achieved, but creep and settling effects occur over long time scales
Solution Approach 1:
The patent replaces the purely mechanical supporting spring device with a hybrid system combining magnetic fields and springs. The magnetic field generates a supporting force that counteracts gravity, reducing the load on the spring device and minimizing creep and settling effects while maintaining vibration isolation capabilities.
Solution Approach 2:
The magnetic field acts as an anti-weight mechanism, generating an upward magnetic supporting force that counterbalances the gravitational force on the measuring device. This reduces the compressive load on the supporting spring device, thereby minimizing creep and settling effects over time.
2Manufacturing precision
If the situation control device is designed with sufficient motion reserve to compensate for creep effects, then imaging accuracy is maintained, but device complexity and cost increase
Solution Approach 1:
The magnetic supporting force is applied in advance to prevent creep and settling effects before they significantly impact imaging accuracy. By continuously counteracting gravitational effects, the system maintains the initial alignment of optical components without requiring large motion reserves for compensation.
Solution Approach 2:
The measuring device continuously monitors the relative situation between supporting structures, and this information is fed back to the situation control device. The magnetic field strength can be adjusted based on this feedback to maintain precise positioning, reducing the need for large motion reserves.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach simplifies and cost-effectively maintains high imaging quality by reducing static deflections and creep effects, allowing for efficient compensation of long-term changes without the need for extensive motion reserves, thus extending the operational life of the imaging device.
Implementation Method 1
the magnetic device being configured to exert a magnetic supporting force that counteracts the change in the relative situation
Data Source
AI summary
An arrangement of a microlithographic optical imaging device includes first and second supporting structures. The first supporting structure supports an optical element of the imaging device. The first supporting structure supports the second supporting structure via supporting spring devices of a vibration decoupling device. The supporting spring devices act kinematically parallel to one another between the first and second supporting structures. Each of the supporting spring devices defines a supporting force direction and a supporting length along the supporting force direction. The second supporting structure supports a measuring device which measures the position and/or orientation of the at least one optical element in relation to a reference in at least one degree of freedom up to all six degrees of freedom in space. A reduction device reduces a change in a static relative situation between the first and second supporting structures in at least one correction degree of freedom.