Magnetically Coupled Throttle Valve for Low-Flow Gas Control
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Solution Overview
Problem
In substrate processing systems, the restriction of gas flow through downstream valves leads to a large pressure drop, causing reactants/particles to build up and clog gas lines over time.
Innovation Solution
A throttle valve with a magnetically coupled outer and inner actuator system is used to adjust gas flow through the gas line, allowing for precise control of low flow rates and reducing buildup.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Quantity of substance
If the downstream valve is restricted to reduce gas flow in the gas line, then gas flow is reduced, but pressure drop at the valve outlet increases causing particle buildup and clogging
Solution Approach 1:
A second valve is introduced as an intermediary component located between the processing chamber and the first valve. This intermediate valve allows for flow restriction to be distributed across two stages rather than concentrated at one location, preventing excessive pressure drop and particle acceleration at a single valve outlet that causes buildup and clogging
Solution Approach 2:
The gas flow control function is segmented into two separate valves instead of using one valve for all flow control. The first valve provides primary flow control close to the processing chamber, while the second valve provides secondary flow control downstream, dividing the flow restriction task to prevent harmful pressure drops and particle buildup at any single location
2Productivity
If the valve is restricted almost closed to reduce gas flow, then gas flow is reduced, but reactants and particles are accelerated by the pressure drop leading to clogging
Solution Approach 1:
The second valve is positioned and configured to provide preliminary flow adjustment before gas reaches the first valve. By pre-reducing flow at the second valve location, the system avoids the need to restrict the first valve to nearly closed positions, thereby preventing the extreme pressure drops that accelerate particles and cause clogging while maintaining process continuity
3Device complexity
If a single valve is used to control gas flow, then the system is simpler, but precise control of low flow rates is difficult
Solution Approach 1:
The flow control function is segmented into two valves with different control ranges. The first valve handles high-flow control close to the processing chamber, while the second valve handles low-flow control downstream. This segmentation allows each valve to operate in its optimal control range, enabling precise control of low flow rates without requiring an overly complex single-valve solution
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The throttle valve provides more precise control of low flow rates, reduces particle buildup, and allows for longer operation of the processing chamber without maintenance, while being thoroughly cleaned during remote plasma cleaning.
Implementation Method 1
The outer actuator is magnetically coupled to the inner actuator. Movement the outer actuator causes movement of the inner actuator relative to the gas line to adjust a position of the throttle plate.
Data Source
AI summary
A valve of a substrate processing system includes a throttle plate configured to adjust gas flow through a gas line. An outer actuator is arranged outside of the gas line. An inner actuator is arranged inside of the gas line and connected to the throttle plate. The outer actuator is magnetically coupled to the inner actuator. Movement the outer actuator causes movement of the inner actuator relative to the gas line to adjust a position of the throttle plate.