Magnetization Compensation Layer in Memory Contact Plugs

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Solution Overview

Problem

The challenge in fabricating semiconductor memory devices is the difficulty in reducing the etch burden and preventing magnetic field shifts during the patterning process, which affects the integration and magnetic properties of variable resistance elements.

Innovation Solution

Incorporating a magnetization compensation layer with a thickness greater than the critical dimension, formed as a conductive material with horizontal magnetic properties, in the contact plug to offset the magnetic field influence and reduce the total thickness of the variable resistance element stack, thereby simplifying the fabrication process and enhancing magnetic properties.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Ease of manufacture

If the variable resistance element stack is made thinner to reduce etch burden, then the etch process becomes easier and sidewall damage is minimized, but the magnetic field control and separation between elements become more difficult

Engineering Contradiction:
Improveetch burdenVSAvoidmagnetic field control
Core Design Contradiction:
Ease of manufactureVSManufacturing precision

Solution Approach 1:

A magnetization compensation layer is introduced as an intermediary component between the pinned magnetic layer and the free magnetic layer. This layer mediates the magnetic field interactions by providing compensation fields that counteract unwanted magnetic coupling, enabling thinner stack designs while maintaining magnetic field control precision

Inventive Principle:
Principle #24Intermediary (Mediator)

Solution Approach 2:

The patent modifies the magnetic properties by introducing a magnetization compensation layer with specific thickness parameters (greater than critical dimension) and magnetic moment characteristics. This parameter change allows the system to achieve both reduced etch burden and maintained magnetic field control through optimized magnetic compensation

Inventive Principle:
Principle #35Parameter changes

2Productivity

If multiple variable resistance elements are integrated closer together to increase density, then the integration level increases, but magnetic field interference between adjacent elements increases

Engineering Contradiction:
Improveintegration densityVSAvoidmagnetic field interference
Core Design Contradiction:
ProductivityVSObject-generated harmful factors

Solution Approach 1:

The magnetization compensation layer acts as a magnetic field mediator that generates compensation fields to counteract the magnetic interference generated by adjacent variable resistance elements. This allows higher integration density while minimizing magnetic field interference between neighboring elements

Inventive Principle:
Principle #24Intermediary (Mediator)

Solution Approach 2:

The magnetization compensation layer provides preliminary anti-action by pre-establishing compensation magnetic fields that counteract the harmful magnetic interference before it affects the operation of adjacent elements, enabling closer integration without performance degradation

Inventive Principle:
Principle #9Preliminary anti-action

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach reduces the etch burden, minimizes sidewall damage, and improves the magnetic properties of the semiconductor memory devices, allowing for higher integration and easier fabrication by maintaining uniform magnetic fields across multiple elements.

Implementation Method 1

a contact plug arranged in at least one side of the variable resistance element and comprising a magnetization compensation layer

Methodology Applied
Scientific EffectMagnetic field compensation: Magnetic Field

Implementation Method 2

The magnetization compensation layer may comprise a conductive material having a horizontal magnetic property

Methodology Applied
Scientific EffectMagnetization: Magnetism

Data Source

PatentUS9747964B2Electronic devices having semiconductor memory units and method of fabricating the same
Publication Date: 2017.08.29 SK HYNIX INC
  • US9747964B2 patent drawing
  • US9747964B2 patent drawing
  • US9747964B2 patent drawing

AI summary

Electronic devices have a semiconductor memory unit including a magnetization compensation layer in a contact plug. One implementation of the semiconductor memory unit includes a variable resistance element having a stacked structure of a first magnetic layer, a tunnel barrier layer, and a second magnetic layer, and a contact plug arranged in at least one side of the variable resistance element and comprising a magnetization compensation layer. Another implementation includes a variable resistance element having a stacked structure of a first magnetic layer having a variable magnetization, a tunnel barrier layer, and a second magnetic layer having a pinned magnetization; and a contact plug arranged at one side of and separated from the variable resistance element to include a magnetization compensation layer that produces a magnetic field to reduce an influence of a magnetic field of the second magnetic layer on the first magnetic layer.