Magnetized Sputter Device for OLED Encapsulation Film Quality
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Solution Overview
Problem
Conventional sputter devices cannot heat substrates to high temperatures due to thermal vulnerability of organic materials in OLED manufacturing, resulting in deteriorated inorganic film quality for thin film encapsulation.
Innovation Solution
A sputter device incorporating magnetized targets, a reflector, a wave guide, and a limiter forming an electron cyclotron resonance area, which generates high-density plasma and high-energy neutral particle beams to deposit inorganic films without heating the substrate, using microwaves and magnetic fields to improve film quality.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional sputter device is used to form inorganic film, then substrate heating is avoided, but film quality is deteriorated
Solution Approach 1:
The patent changes the physical parameters of the sputtering process by introducing electron cyclotron resonance heating, which increases electron temperature and energy without significantly increasing substrate temperature. This allows high-quality film formation while maintaining low substrate temperature suitable for organic light-emitting elements
Solution Approach 2:
The patent employs periodic microwave heating cycles in the electron cyclotron resonance region, where microwaves are applied intermittently to generate plasma and heat electrons periodically. This periodic energy input improves film quality through enhanced atomic mobility during deposition without causing thermal damage to the substrate
2Manufacturing precision
If substrate is heated to high temperature to improve film quality, then inorganic film quality is improved, but organic material is damaged
Solution Approach 1:
The patent applies local heating through electron cyclotron resonance in a specific region of the sputtering chamber, where microwaves are concentrated to heat electrons and ions locally near the substrate surface. This localized energy input improves film quality at the deposition interface without heating the entire substrate and organic light-emitting elements
Solution Approach 2:
The patent introduces microwaves as an intermediary energy carrier that transfers energy to electrons and ions in the plasma, which then transfer this energy to arriving atoms during film deposition. This indirect energy transfer mechanism improves film quality without requiring direct thermal heating of the substrate and organic materials
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The device forms high-density inorganic films for OLED encapsulation without heating the substrate, enhancing film quality and reducing production and maintenance costs by utilizing magnetic fields and microwaves to create a high-density plasma and neutral particle beams for deposition.
Implementation Method 1
a wave guide having magnetism and arranged on or adjacent the targets, the wave guide forming a guide space for guiding microwaves
Implementation Method 2
a limiter having magnetism and arranged on or adjacent the wave guide, the limiter forming an electron cyclotron resonance area together with the targets, the reflector, and the wave guide
Implementation Method 3
a plurality of targets having magnetism; a reflector having magnetism and arranged between neighboring targets of the plurality of targets
Implementation Method 4
a sputter device includes: a plurality of targets having magnetism... Plasma may be discharged in the electron cyclotron resonance area
Data Source
AI summary
A sputter device including a plurality of targets having magnetism; a reflector having magnetism and arranged between neighboring targets of the plurality of targets; a wave guide having magnetism and arranged adjacent the targets, the wave guide forming a guide space for guiding microwaves; and a limiter having magnetism and arranged adjacent the wave guide, the limiter forming an electron cyclotron resonance area together with the targets, the reflector, and the wave guide.