Magnetron-Target Coupling With Axial Interface for Stable Plasma Control
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Solution Overview
Problem
The spatial distribution of plasma in magnetron sputtering processes is sensitive to the magnetic field, leading to issues with process stability, reproducibility, target utilization, and homogeneity due to disturbances and interference in the magnet system communication.
Innovation Solution
A magnetron-target coupling with an axially adjustable communication interface that allows for contactless communication with the magnet system, compensating for tolerances and thermal expansion, reducing interference by using a resilient element and linear bearings to facilitate reliable magnet system control.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If traditional contact-based communication is used in the magnet system, then electrical connection is established, but wear and interference occur reducing reliability
Solution Approach 1:
The patent replaces mechanical contact-based electrical connection with contactless electromagnetic induction coupling. The transmitter coil generates a magnetic field that induces current in the receiver coil, eliminating physical contact between rotating and stationary parts. This substitution of mechanical system with electromagnetic field-based system resolves the wear and interference problems while maintaining reliable communication.
Solution Approach 2:
The patent introduces electromagnetic fields as an intermediary medium to transfer energy and signals between the rotating magnet system and the stationary housing. The transmitter and receiver coils act as mediators that couple the two systems without direct contact, allowing power and communication signals to pass through the air gap without mechanical connection, thus eliminating wear and reducing interference.
2Stability of the object's composition
If rigid coupling is used between magnet system and target, then structural stability is maintained, but thermal expansion and tolerance issues arise
Solution Approach 1:
The patent employs a dynamic coupling mechanism where the magnet system can rotate independently on bearings within the housing. This dynamic arrangement allows the system to adapt to thermal expansion and manufacturing tolerances through controlled movement, while the electromagnetic coupling maintains stable energy and signal transfer. The system transitions from rigid fixed positioning to controlled dynamic positioning.
Solution Approach 2:
The patent allows for changes in positional parameters (axial and radial positions) of the magnet system relative to the housing through the use of bearings and electromagnetic coupling. This enables the system to compensate for thermal expansion and assembly tolerances by adjusting positions within acceptable ranges while maintaining functional stability and communication effectiveness.
3Productivity
If magnetic field penetration through cathode is increased to improve plasma formation, then sputtering efficiency improves, but communication interference with magnet system increases
Solution Approach 1:
The patent uses electromagnetic fields as an intermediary to transfer communication signals and power without direct electrical connection to the magnet system. This intermediary approach allows strong magnetic fields to penetrate the cathode for efficient plasma generation while the contactless electromagnetic coupling isolates the communication system from interference, as the signals are transmitted through induced fields rather than direct conductive paths.
Solution Approach 2:
The patent replaces direct electrical connections with electromagnetic induction coupling, substituting a mechanical/electrical contact system with a field-based system. This allows the magnet system to operate with high current and strong magnetic fields for improved sputtering efficiency while the contactless communication system remains isolated from the electromagnetic interference generated during high-power operation.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enhances plasma atomization uniformity and coating consistency by improving magnet system communication, reducing wear, and minimizing disturbances, thereby stabilizing the process and enhancing target utilization.
Implementation Method 1
the first communication electrode, which is in a manner attached, such that the second communication electrode may be moved towards and/or away from this way
Implementation Method 2
The magnetic field may be generated by a magnet system and penetrate the cathode (then also referred to as magnetron cathode), so that a toroidal plasma channel, a so-called racetrack, may be formed on the surface of the target material
Implementation Method 3
By means of sputtering (i.e. by means of a sputtering process), for example, one layer or plurality of layers may be deposited on a substrate. For this purpose, a plasma-forming gas may be ionized by means of a cathode, and a material to be deposited (target material) may be sputtered by means of the plasma formed in the process
Implementation Method 4
A magnetron-target coupling with an axially adjustable communication interface that allows for contactless communication with the magnet system, compensating for tolerances and thermal expansion, reducing interference by using a resilient element
Data Source
AI summary
Disclosed herein are devices, methods, and systems related to a magnetron-target coupling that includes a target coupling flange, a shaft fixedly coupled to the target coupling flange on a face opposite the target coupling flange, and having a first linear bearing component on a face opposite the target coupling flange. The magnetron-target coupling also includes a communication interface having a first communication electrode and a second communication electrode that are electrically coupled to each other wherein the second communication electrode is fixedly attached to the target coupling flange on a side opposite the shaft, the target coupling flange being disposed between the first communication electrode and the second communication electrode. The first communication electrode is supported such that it may be moved toward and/or away from the second communication electrode.