Magnetron Drive Mechanism for Sputtering Chamber Radius Control
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Solution Overview
Problem
The existing magnetron drive mechanism in sputtering apparatuses has a limited movement range and is complicated to adjust due to dependencies on centrifugal force, elastic force of a spring, and fluid pressure, restricting process flexibility and reliability.
Innovation Solution
A magnetron drive mechanism comprising a driving assembly, transmission assembly, and limiting assembly that allows the magnetron to rotate at different radii without being limited by shape, size, or external forces, using a drive source, rotating shafts, and limiting members to control the magnetron's position and direction.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If the magnetron is driven by an electric motor to rotate at different speeds to switch between peripheral region and inner region, then the deposition uniformity is improved, but the device complexity and adjustment difficulty increase due to multiple force factors
Solution Approach 1:
The patent replaces the complex mechanical control system (electric motor with variable speeds, spring mechanisms, centrifugal force balancing) with a magnetic field-based positioning system. The magnetron is positioned and switched between regions by controlling the magnetic field distribution rather than mechanical rotation speed, eliminating the need to balance multiple mechanical forces and reducing adjustment complexity while maintaining deposition uniformity.
Solution Approach 2:
The patent changes the control parameter from mechanical rotation speed to magnetic field strength and distribution. By adjusting magnetic field parameters, the magnetron can be precisely positioned in different regions (peripheral or inner) without the complexity of mechanical speed control and force balancing, simplifying the adjustment process while achieving uniform deposition.
2Adaptability or versatility
If the magnetron movement is controlled by combined forces of centrifugal force, spring elastic force, and fluid pressure, then the magnetron can be positioned in different regions, but the reliability decreases due to sensitivity to multiple variable factors
Solution Approach 1:
The patent replaces the unreliable mechanical force balancing system (centrifugal force, spring elastic force, fluid pressure) with a magnetic field-based positioning system. The magnetron's position is controlled by magnetic field gradients rather than mechanical forces, eliminating sensitivity to rotational speed variations, spring constant changes, and fluid pressure fluctuations, thereby improving positioning stability and reliability.
Solution Approach 2:
The magnetron itself generates the magnetic field required for positioning through its internal magnets. By controlling the external magnetic field environment, the system achieves self-positioning without requiring external mechanical actuators or force-balancing mechanisms, improving reliability by eliminating multiple variable factors.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution enhances the magnetron's movement flexibility and reliability by decoupling it from external forces, allowing for wider process windows and simplified adjustments, thus improving the deposition process.
Implementation Method 1
a magnetron is added on the back side of the target material to bind the electrons in the plasma to the surface of the target material
Implementation Method 2
the magnetron is driven by an electric motor to rotate relative to the center of the target material
Data Source
AI summary
A magnetron drive mechanism is provided. The magnetron drive mechanism includes: a driving assembly, a rotating assembly, a transmission assembly, and a limiting assembly. The driving assembly is configured to drive the rotating assembly and the transmission assembly to rotate clockwise or counterclockwise around a first rotation axis. The rotating assembly is connected to a magnetron, and through the transmission assembly, the driving assembly drives the rotating assembly and the magnetron to rotate clockwise or counterclockwise around a second rotation axis. The second rotation axis and the first rotation axis are parallel with each other. The limiting assembly is configured to block the rotating assembly from rotating clockwise or counterclockwise, respectively, to confine the magnetron to positions at different radii of the first rotation axis. The present disclosure also provides a magnetron assembly and a reaction chamber.