Magnetron Sputtering Interior Coating Uniformity
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Solution Overview
Problem
Existing methods for depositing protective coatings on the interior surfaces of tubular workpieces, such as gun barrels and engine cylinders, are inefficient and ineffective, as they struggle to provide uniform and durable coatings due to limitations in magnetron sputtering systems.
Innovation Solution
A method involving a magnetron sputtering process where a copper-containing workpiece is positioned within a vacuum chamber with a sputter target material and a magnet assembly, generating a circumferentially directed magnetic field to ionize gas and deposit a nanostructured chromium or copper-chromium coating on the interior surface, enhancing coating uniformity and utilization.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional magnetron sputtering systems are used to coat interior tubular surfaces, then coating deposition is attempted, but the coating uniformity and process efficiency are poor
Solution Approach 1:
The patent inverts the conventional magnetron sputtering configuration by placing the magnet assembly inside the sputter target material rather than outside. This inversion creates a circumferential magnetic field that efficiently confines plasma within the tubular workpiece, enabling uniform coating deposition on interior surfaces while significantly improving target material utilization and process efficiency
Solution Approach 2:
The patent implements a nested configuration where the magnet assembly is positioned inside the sputter target material, which itself is positioned inside the tubular workpiece. This nested arrangement (magnet within target within workpiece) creates an efficient plasma confinement geometry that solves both coating uniformity and process efficiency problems simultaneously
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This method achieves a substantially uniform and efficient deposition of nanostructured coatings on tubular workpieces, significantly improving wear resistance, corrosion resistance, and high-temperature oxidation resistance, with greater than 95% utilization of the sputter target material.
Implementation Method 1
generating a circumferentially directed magnetic field with the magnet assembly proximate the sputter target material, thereby ionizing the gas to produce plasma thereof
Implementation Method 2
ionizing the gas to produce plasma thereof
Implementation Method 3
bombardment of the sputter target material by the plasma causes particles of the sputter target material to be directed toward and deposited on the interior surface, thereby forming a nanostructured coating
Data Source
AI summary
A method for depositing a nanostructured coating comprising chromium or a copper-chromium mixture on a workpiece. The workpiece may comprise a hollowed structure such as a rocket or jet engine combustion chamber liner. The method comprises providing a magnetron and an external sputter target material comprising chromium or a copper-chromium composite and effecting a magnetron sputter deposition to deposit a substantially uniform nanostructured coating comprising said sputter target material on said workpiece. The method may include plasma enhancement wherein a filament is utilized to produce a plasma that effects an ion bombardment on the workpiece during the magnetron sputter deposition process. The invention also includes the nanostructured coatings deposited by these methods and workpieces coated thereby.