Magnetron Sputtering for Uniform Optical Films Without Reactive Gas
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Solution Overview
Problem
Current methods for producing optical precision films face challenges such as high rejects, low long-term stability, and the inability to achieve technical specifications, particularly in high-uniformity and low-loss applications.
Innovation Solution
A method and device for producing uniform films using magnetron sputtering, where the source material is deposited without a separate reactive gas supply, allowing for the deposition of substoichiometric films that can be oxidized subsequently, achieving high uniformity and low absorption.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If conventional magnetron sputtering with separate reactive gas supply is used, then deposition rate can be maintained, but film uniformity and stoichiometry control deteriorate
Solution Approach 1:
The patent combines the source material and reactive gas component into a single integrated target material. This merging eliminates the need for separate reactive gas supply during deposition, ensuring consistent stoichiometry and improving film uniformity while maintaining deposition rate through optimized target composition and sputtering parameters.
Solution Approach 2:
The patent changes the physical and chemical parameters of the target material by incorporating reactive gas components directly into the target composition. This parameter change allows simultaneous achievement of high deposition rate and precise stoichiometry control, resolving the contradiction between productivity and manufacturing precision.
2Adaptability or versatility
If separate reactive gas supply is used during sputtering, then film composition can be adjusted, but long-term process stability deteriorates
Solution Approach 1:
The reactive gas component is pre-incorporated into the target material during target fabrication. This preliminary action ensures that the reactive gas is uniformly distributed throughout the target, eliminating the need for separate gas supply during deposition and thereby ensuring long-term process stability while maintaining film composition control.
Solution Approach 2:
The target material serves itself by containing the reactive gas component internally. This self-service mechanism eliminates external gas supply requirements, reducing process complexity and improving long-term stability while maintaining the ability to control film composition through target design.
3Productivity
If high deposition rate is pursued, then productivity increases, but film absorption losses increase
Solution Approach 1:
The patent optimizes the target material parameters by incorporating reactive gas components and adjusting composition ratios. This allows achieving high deposition rates while maintaining low absorption losses through improved film density and reduced defects, resolving the contradiction between productivity and energy loss.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The method achieves stable and high-throughput deposition of uniform films with low absorption losses, exceeding 99% uniformity, which is critical for precision optics and high-quality optical filters.
Implementation Method 1
by deposition of at least one source material by means of magnetron sputtering
Implementation Method 2
at least one plasma source for oxidizing the at least one film made of at least one source material on the substrate
Data Source
AI summary
The invention relates to the deposition of optical precision films with high uniformity, precision, particle freedom and low absorption on the substrate. For this purpose, a method and a device are proposed. The approach is the use of target materials and also possibly of surfaces in the sputtering field. Particularly high uniformity and also particularly low residual absorption are achieved with these materials. The invention is suitable for the production of optical thin-film filters, as are used for example in laser material machining, laser components, optical sensors for measuring technology, or in medical diagnostics.