Magnetron Sputtering Power Control for High-Deposition Rates
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Solution Overview
Problem
Magnetron sputtering methods for coating have relatively slow deposition rates, making them impractical for coating lower-cost articles, and often result in inferior coatings compared to higher-rate methods, particularly for corrosive environments like fuel cell plates, which typically require expensive inert metals for protection.
Innovation Solution
A method involving increased power supply to magnetrons with improved cooling and turbulent fluid flow, allowing higher current with minimal voltage increase, enabling faster deposition rates while maintaining coating quality and preventing arcing, using a magnetron with a graphite microcrystalline carbon-based coating for corrosion resistance and conductive properties.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional magnetron sputtering is used to maintain coating quality, then coating quality is preserved, but deposition rate is slow
Solution Approach 1:
The patent changes the power supply parameters by increasing current at a greater rate than voltage during sputter deposition. This parameter modification allows operation at higher power levels while maintaining coating quality, thereby increasing deposition rate without sacrificing manufacturing precision
Solution Approach 2:
The patent implements dynamic control of power supply parameters during the deposition process, adjusting current and voltage rates dynamically. This allows the system to operate in different regimes - maintaining quality when needed and increasing speed when possible - resolving the contradiction between steady quality and variable deposition rate
2Productivity
If higher deposition rate methods are used to increase productivity, then deposition rate is increased, but coating quality becomes inferior
Solution Approach 1:
By modifying the power supply parameters (increasing current rate greater than voltage rate) and implementing improved cooling, the patent enables higher deposition rates while maintaining the coating quality that would otherwise only be achievable with conventional slower methods
Solution Approach 2:
The patent replaces conventional cooling mechanisms with an improved cooling system that uses turbulent fluid flow. This substitution allows higher power operation without compromising coating quality, enabling faster deposition rates while maintaining manufacturing precision
3Productivity
If power supply level is increased to increase deposition rate, then deposition rate increases, but arcing and defects occur
Solution Approach 1:
The patent introduces improved cooling as an intermediary system that manages the thermal load when higher power is applied. The turbulent fluid flow cooling system prevents overheating that would cause arcing, allowing higher deposition rates without compromising reliability
Solution Approach 2:
The patent applies preliminary cooling action before arcing can occur by using turbulent fluid flow to prevent heat buildup. This preventive measure counteracts the tendency toward arcing when operating at higher power levels, maintaining coating reliability while increasing deposition rate
4Stability of the object's composition
If conventional cooling is used to maintain operation, then system stability is maintained, but deposition rate is limited
Solution Approach 1:
The patent uses hydraulic cooling with turbulent fluid flow through the magnetron system. This hydraulic approach provides more efficient heat removal compared to conventional cooling, enabling higher power operation and increased deposition rates while maintaining system stability through effective temperature control
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach significantly increases deposition rates, achieving coating speeds comparable to arc sources without defects, providing conductive, corrosion-resistant coatings with improved tribological properties, making the process economically viable for high-volume articles like fuel cell plates.
Implementation Method 1
a method for coating by sputtering of material from one or a series of targets provided as part of respective magnetrons
Implementation Method 2
means to allow the introduction and passage of a cooling fluid
Implementation Method 3
improved cooling and turbulent fluid flow
Data Source
Figure 1~2
Figure 3
Figure 4~5
AI summary
The invention relates to the provision of apparatus and a method which can be used to allow the sputter deposition of material onto at least one article to form a coating on the same. The new form of magnetron described herein allows an increase in sputter deposition rates to be achieved at higher powers and without causing damage to the coating is created. This can be achieved by improved cooling and use of a relatively high magnetic field in the magnetron while at the same time increasing the power to the magnetron by increasing the current at a rate faster than the voltage.