Manifold Liquid Raw Material Supply Unit for Semiconductor Vaporizer
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Existing liquid raw material supply lines for semiconductor manufacturing are bulky and inefficient, leading to prolonged cleaning times due to large mounting spaces and poor liquid-liquid and liquid-gas replacement rates, which result in lower manufacturing efficiency and increased cycle times.
Innovation Solution
A miniaturized liquid raw material supply unit with a manifold and integrated fluid control valves, including a liquid raw material control valve, a cleaning solution control valve, a purge gas control valve, and an introducing valve, configured to enhance the replacement rate of residual liquids through direct flow paths, reducing dead spaces and improving cleaning efficiency.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Volume of moving object
If a conventional liquid raw material supply line with multiple valves and pipes is used, then the system can supply liquid raw material to the vaporizer, but the mounting space becomes large and the device becomes bulky
Solution Approach 1:
The patent integrates multiple valves (liquid raw material supply valve, cleaning solution supply valve, purge gas supply valve, introducing valve) and pipes into a single compact manifold assembly. This merging of components directly reduces the mounting space while maintaining the necessary functional complexity for supplying liquid raw material, cleaning, and purging operations.
Solution Approach 2:
The manifold serves multiple functions simultaneously: it acts as a distribution hub for liquid raw material, cleaning solution, and purge gas; provides mounting structure for multiple valves; and enables sequential cleaning and purging operations. This multi-functionality reduces the need for separate components, thereby reducing overall mounting space.
2Productivity
If a conventional liquid raw material supply line is used, then the system can perform cleaning operations, but the cleaning time becomes prolonged due to poor liquid-liquid and liquid-gas replacement rates
Solution Approach 1:
The patent segments the flow path into distinct sections controlled by individual valves (liquid raw material supply valve, cleaning solution supply valve, purge gas supply valve, introducing valve). This segmentation allows precise control over fluid flow directions and enables efficient sequential replacement operations, improving both liquid-liquid and liquid-gas replacement rates while reducing cleaning time.
Solution Approach 2:
The manifold is pre-configured with dedicated flow paths and valve arrangements that enable immediate initiation of cleaning and purging operations. The preliminary design of the flow paths ensures optimal fluid dynamics for rapid replacement, eliminating delays that would occur in conventional systems that require reconfiguration.
3Quantity of substance
If a conventional liquid raw material supply line is used, then the system can supply liquid raw material, but dead spaces are formed leading to poor replacement rates and extended replacement time
Solution Approach 1:
Instead of allowing dead spaces to form in conventional pipe arrangements, the patent inverts the design approach by creating a manifold structure where all flow paths are optimized to eliminate stagnant zones. The flow paths are designed to ensure complete fluid replacement by directing flow through all sections, preventing the formation of dead spaces that would otherwise require extended replacement time.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution significantly reduces cleaning time, enhances the replacement rate of residual liquids, and allows for complete removal of cleaning solutions and purge gases, thereby improving manufacturing efficiency and reducing the risk of particle generation and clogging in semiconductor production.
Implementation Method 1
a pressurizing gas (e.g., He gas or another inert gas) is fed into a valve V2 of the monoblock valve X1 and then enters a liquid raw material tank 121 through a valve V1 of the monoblock valve X1 and a valve V4 of the monoblock valve X2 to pressurize the liquid raw material to be supplied to the vaporizer
Implementation Method 2
a liquid raw material is supplied to a vaporizer in which the liquid raw material is vaporized, and this vaporized gas is supplied to a reactor
Data Source
AI summary
A liquid raw material supply unit for a vaporizer is adapted to supply a liquid raw material to the vaporizer that vaporizes the liquid raw material. The unit comprises: a manifold internally formed with a flow passage; and a plurality of fluid control valves mounted on the manifold, wherein the plurality of fluid control valves includes: a liquid raw material control valve for controlling supply of the liquid raw material to the flow passage; a cleaning solution control valve for controlling supply of a cleaning solution to the flow passage; a purge gas control valve for controlling supply of a purge gas to the flow passage; and a first introducing control valve connectable to the vaporizer for controlling supply of a fluid from the flow passage to the vaporizer, the purge gas control valve, the cleaning solution control valve, the liquid raw material control valve, and the first introducing control valve being mounted on the manifold in this order from an upstream side of the manifold, wherein the flow passage is connected to valve ports of the plurality of control valves respectively, the valve ports communicating with valve openings of the respective control valves, and the flow passage is configured to allow the purge gas supplied from the purge gas control valve to directly flow in the valve ports of the cleaning solution control valve and the liquid raw material control valve placed downstream from the purge gas control valve.