Manufacturing Abnormality Management for Defect Cause Prioritization

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Solution Overview

Problem

Existing quality control and maintenance methods for manufacturing facilities are inefficient in identifying the exact cause of defects and abnormalities, often requiring expert knowledge and trial-and-error adjustments, especially when multiple errors occur, as they fail to distinguish between defects caused by device members, other processes, or components, and cannot determine the nature of abnormalities.

Innovation Solution

A management system for manufacturing facilities that includes a display unit, device member and product member information acquisition units, manufacturing and inspection abnormality acquisition units, and an improvement candidate information unit to create and display aggregated abnormality values for each device and product member, enabling efficient identification and prioritization of improvement candidates.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Measurement precision

If conventional defect rate aggregation methods are used to identify malfunction positions, then the location of defects can be found, but the exact cause of defects cannot be determined and expert knowledge is required for analysis

Engineering Contradiction:
Improvedefect cause identification accuracyVSAvoidtime for expert analysis and trial-and-error adjustment
Core Design Contradiction:
Measurement precisionVSLoss of time

Solution Approach 1:

The patent segments defect analysis into multiple dimensions: defect types, device members, product members, and abnormality kinds. By categorizing defects along these segments and using multi-dimensional tagging, the system can precisely identify not just the location but the specific cause of defects, eliminating the need for expert trial-and-error analysis.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The patent introduces multiple analysis dimensions (defect type, device member, product member, abnormality kind) to transform the traditional single-dimension defect rate aggregation into a multi-dimensional analysis framework. This dimensional expansion enables precise cause identification by cross-referencing across different dimensions.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

2Loss of information

If conventional defect rate aggregation methods are used, then defect locations can be identified, but the nature of abnormalities cannot be determined

Engineering Contradiction:
Improveinformation about abnormality type and natureVSAvoidcomplexity of information processing system
Core Design Contradiction:
Loss of informationVSDevice complexity

Solution Approach 1:

The patent segments abnormality information into distinct categories including defect types, device members, product members, and abnormality kinds. Each segment is tagged and stored independently, allowing comprehensive information capture without creating an unmanageably complex system.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The patent introduces a management device as an intermediary between inspection devices and users. This mediator automatically collects, processes, and organizes defect information across multiple dimensions, reducing the complexity burden on users while preserving complete abnormality information.

Inventive Principle:
Principle #24Intermediary (Mediator)

3Measurement precision

If defect rates are aggregated by device members only, then malfunction positions can be found, but defects caused by other processes or components cannot be distinguished

Engineering Contradiction:
Improvedefect cause attribution accuracyVSAvoidability to analyze defects from multiple sources
Core Design Contradiction:
Measurement precisionVSAdaptability or versatility

Solution Approach 1:

The patent segments defect attribution into multiple sources: device members, product members, processes, and other factors. By creating separate segments for each source and enabling multi-dimensional cross-analysis, the system can precisely attribute defects to their actual causes while maintaining the ability to analyze defects from any or multiple sources simultaneously.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The patent creates a universal defect analysis framework that can handle multiple defect sources (device members, product members, processes, external factors) through a unified multi-dimensional tagging system. This universal approach allows the system to adaptively analyze defects regardless of their origin.

Inventive Principle:
Principle #6Universality (Multi-functionality)

Data Source

PatentUS12385851B2Management system, management device, management method, and program
Publication Date: 2025.08.12 OMRON CORP
  • US12385851B2 patent drawing
  • US12385851B2 patent drawing
  • US12385851B2 patent drawing

AI summary

A management system for a manufacturing facility including a manufacturing device including one or more device members for manufacturing a product, and an inspection device, the system including a display unit, a device member information acquisition unit, a product member information acquisition unit, a manufacturing abnormality information acquisition unit, an improvement candidate information acquisition unit configured to acquire improvement candidate information about candidates for improvement in the manufacturing facility, and a management work support unit configured to create list information and to cause the display unit to display the list information, the list information including an aggregated value of abnormalities of each sort during manufacturing the product and an aggregated value of abnormalities of each sort during inspecting the product within a predetermined aggregation time period, for each device member and/or product member as the candidate for improvement.