Mask Alignment Module Using Optical Feedback for Semiconductor Substrates

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Solution Overview

Problem

The challenge in semiconductor device processing is the difficulty in accurately aligning masks over substrates during deposition and etching processes, which is crucial for controlling material placement and reducing the need for expensive steps like lithography and etching, but current methods lack efficient solutions for precise mask alignment and management.

Innovation Solution

An integrated platform with a mask stocker, alignment stage, and transfer robot is used to house and accurately position masks over substrates, enabling precise alignment and positioning through a combination of mechanical and optical systems, allowing for the control of material deposition and etching processes.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Productivity

If a mask is positioned over a substrate during deposition to control material placement, then expensive process steps like lithography and etching become unnecessary, but accurate alignment of the mask with the substrate becomes critical and difficult to achieve

Engineering Contradiction:
Improveprocess efficiencyVSAvoidmask alignment accuracy
Core Design Contradiction:
ProductivityVSManufacturing precision

Solution Approach 1:

The system performs preliminary alignment actions by positioning the mask on the substrate before deposition begins. The mask is pre-aligned using mechanical positioning systems and optical alignment tools that detect fiducial markers on the substrate, ensuring accurate placement before the actual deposition process starts

Inventive Principle:
Principle #10Preliminary action

Solution Approach 2:

The system replaces purely mechanical alignment methods with optical alignment systems that use light-based detection and feedback mechanisms. Optical sensors and cameras detect substrate features and provide real-time feedback to adjust mask positioning, achieving higher precision than mechanical systems alone

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

2Adaptability or versatility

If multiple layers are deposited through masks, then complex semiconductor structures can be created, but accurate alignment becomes even more important and difficult to maintain

Engineering Contradiction:
Improvemulti-layer deposition capabilityVSAvoidalignment accuracy
Core Design Contradiction:
Adaptability or versatilityVSManufacturing precision

Solution Approach 1:

The system implements feedback mechanisms where optical sensors continuously monitor the position of the mask relative to substrate fiducial markers during each deposition step. The system provides real-time feedback to positioning actuators, making dynamic adjustments to maintain alignment accuracy across multiple layers and deposition cycles

Inventive Principle:
Principle #23Feedback

Solution Approach 2:

The alignment system serves multiple functions: it aligns masks for single-layer deposition, maintains alignment for multi-layer deposition, and works with different mask types and substrate configurations. The same optical alignment infrastructure supports various deposition processes, making the system universally applicable

Inventive Principle:
Principle #6Universality (Multi-functionality)

3Productivity

If masks are used to control deposition areas, then lithography and etching steps are reduced, but the need for precise mask placement increases system complexity

Engineering Contradiction:
Improveprocess step reductionVSAvoidalignment system complexity
Core Design Contradiction:
ProductivityVSDevice complexity

Solution Approach 1:

The system merges the mask positioning function with the deposition chamber itself, integrating the alignment and positioning mechanisms directly into the deposition equipment. This consolidation eliminates the need for separate alignment tools and manual positioning procedures, reducing overall system complexity despite the increased precision requirements

Inventive Principle:
Principle #5Merging (Combining)

Data Source

PatentUS11538706B2System and method for aligning a mask with a substrate
Publication Date: 2022.12.27 APPLIED MATERIALS INC
  • US11538706B2 patent drawing
  • US11538706B2 patent drawing
  • US11538706B2 patent drawing

AI summary

An alignment module for positioning a mask on a substrate comprises a mask stocker, an alignment stage, and a transfer robot. The mask stocker houses a mask cassette that stores a plurality of masks. The alignment stage is configured to support a carrier and a substrate. The transfer robot is configured to transfer one of the one or more masks from the mask stocker to the alignment stage and position the mask over the substrate. The alignment module may be part of an integrated platform having one or more transfer chambers, a factory interface having a substrate carrier chamber and one or more processing chambers. A carrier may be coupled to a substrate within the substrate carrier chamber and moved between the processing chambers to generate a semiconductor device.