Precision Mask Alignment and Pneumatic Deformation Control
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Solution Overview
Problem
Current lithography machine control systems face inefficiencies due to slow transmission speeds using USB serial or Ethernet ports, leading to increased workload for the host computer and reduced processing speed, which hampers alignment and mask correction precision.
Innovation Solution
An intelligent correction device control system incorporating a sixteen-way pneumatic fine-tuning mask deformation control subsystem and an alignment subsystem, utilizing a PLC controller with PID control, force sensors, and electro-pneumatic proportional valves for precise mask deformation control, and an eight-way image acquisition CCD system for alignment, connected via industrial Ethernet and PCIe buses for high-speed communication.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of manufacture
If USB serial port or Ethernet port transmission is used for image processing and acquisition, then the system structure is simple and easy to implement, but the transmission speed is slow and the processing efficiency is reduced
Solution Approach 1:
The patent replaces the mechanical/electrical transmission system (USB serial port or Ethernet port) with an optical transmission system (PCIe bus). This substitution enables much higher data transmission speeds while maintaining system integration. The PCIe bus provides direct connection between the image acquisition card and host computer, eliminating the bottleneck of traditional serial or Ethernet transmission and significantly improving image processing efficiency.
2Device complexity
If all image processing operations are completed by the host computer control system, then the system structure is simple, but the workload of the host computer increases and the processing speed decreases
Solution Approach 1:
The patent divides the image processing tasks into two segments: the image acquisition card handles data acquisition and preliminary processing, while the host computer performs higher-level control and analysis. This segmentation reduces the workload on the host computer and allows parallel processing, thereby reducing overall processing time while maintaining system simplicity through modular architecture.
Solution Approach 2:
The image acquisition card acts as an intermediary between the imaging system and the host computer. It performs intermediate processing functions including data acquisition, preprocessing, and high-speed data transmission via PCIe bus, thereby relieving the host computer from handling all low-level processing tasks and improving overall system efficiency.
3Device complexity
If traditional control systems are used for mask deformation control, then the device complexity is low, but the control precision and response speed are insufficient for super-resolution lithography requirements
Solution Approach 1:
The patent implements a dynamic control system for mask deformation using a pneumatic fine-tuning mechanism with multiple independently controllable actuators. This dynamic system allows real-time adjustment of mask position and shape with high precision, responding quickly to control signals while maintaining system stability. The dynamic nature of the pneumatic system enables fine-grained control without excessive mechanical complexity.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The system achieves faster and more accurate mask deformation control and alignment with improved precision, reducing the workload on the host computer and enhancing overall system efficiency by utilizing closed-loop feedback and high-speed data transmission.
Implementation Method 1
a sixteen-way electro-pneumatic proportional valve configured to control an intensity of an output force of the sixteen-way cylinder according to the first control feedback quantity
Implementation Method 2
a sixteen-way force sensor configured to acquire the force value of the mask deformation
Implementation Method 3
a sixteen-way cylinder configured to output the force deforming the mask
Implementation Method 4
a PID controller configured to compare the digital signal obtained by the A/D conversion with the output force set value, and generate the first control feedback quantity
Data Source
AI summary
Provided is an intelligent correction device control system for a super-resolution lithography precision mask, including: a sixteen-way pneumatic fine-tuning mask deformation control subsystem configured to deform a mask, detect a force value of a mask deformation, compare the force value of the mask deformation with an output force set value, and generate a first control feedback quantity to adjust a force deforming the mask, so as to control a deformation quantity of the mask; and an alignment subsystem configured to acquire images of the mask and a substrate, and adjust a position between the mask and the substrate according to the images, so as to align the mask with the substrate.