Precision Mask Alignment With Pneumatic Deformation Feedback
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Solution Overview
Problem
Current lithography machine control systems face inefficiencies due to slow transmission speeds, increased workload on host computers, and reduced alignment efficiency, necessitating a higher precision control system for accurate, quick, and stable mask correction and alignment.
Innovation Solution
An intelligent correction device control system is developed, featuring a sixteen-way pneumatic fine-tuning mask deformation control subsystem with a PLC controller, air pressure output control, and force detection feedback, along with an alignment subsystem using an eight-way image acquisition CCD camera and industrial Ethernet communication for precise mask deformation control and alignment.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Speed
If USB serial port or Ethernet port transmission is used for image processing, then the control system can acquire images, but the transmission speed is slow and processing efficiency is reduced
Solution Approach 1:
The control system is segmented into a host computer control system and an independent automatic control system. The automatic control system handles real-time image acquisition and mask deformation control, while the host computer handles high-level decision making. This segmentation allows parallel processing and eliminates the bottleneck of serial communication between image acquisition and processing.
Solution Approach 2:
An automatic control system acts as an intermediary between the image acquisition devices and the host computer. This intermediary system processes images locally and controls the mask deformation in real-time, reducing the communication burden on the host computer and enabling faster response times.
2Ease of operation
If all image processing operations are completed by the host computer control system, then centralized control is achieved, but the workload of the host computer increases and processing speed decreases
Solution Approach 1:
The control functions are segmented between the host computer and the automatic control system. The host computer performs high-level control and monitoring, while the automatic control system handles time-critical image processing and mask adjustment operations. This division reduces the host computer's workload while maintaining centralized oversight.
Solution Approach 2:
The automatic control system is designed to autonomously perform image processing and mask deformation control without requiring constant host computer intervention. It independently processes acquired images, determines alignment corrections, and actuates the mask positioning mechanisms, enabling self-service operation that reduces processing time.
3Manufacturing precision
If conventional control systems are used for mask alignment and correction, then basic functionality is provided, but alignment efficiency and precision are insufficient
Solution Approach 1:
The system implements closed-loop feedback control where the automatic control system continuously monitors mask position through image acquisition, compares it with the desired position, and automatically adjusts the mask deformation to correct alignment errors. This feedback mechanism enables both high precision and efficient alignment operations.
Solution Approach 2:
The system replaces manual mechanical alignment operations with an automated control system that uses image processing and electronic control to adjust mask position. This substitution eliminates manual intervention, improves measurement precision through digital image analysis, and increases alignment efficiency through automated decision-making and actuation.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The system achieves high precision mask deformation control and alignment, improving efficiency and accuracy by utilizing closed-loop feedback control and high-speed image processing, thereby enhancing the overall performance of the lithography process.
Implementation Method 1
a sixteen-way cylinder and a sixteen-way electro-pneumatic proportional valve; the sixteen-way cylinder is configured to output the force deforming the mask
Implementation Method 2
a sixteen-way force sensor configured to acquire the force value of the mask deformation
Implementation Method 3
a pressure sensor configured to acquire an air pressure in a connection air pipe of the sixteen-way air cylinder
Implementation Method 4
compare the force value of the mask deformation with an output force set value, and generate a first control feedback quantity, so as to adjust a force deforming the mask
Implementation Method 5
the PLC controller subsystem is further configured to compare the air pressure with a preset air pressure value, and generate a second control feedback quantity
Data Source
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AI summary
Provided is an intelligent correction device control system for a super-resolution lithography precision mask, including: a sixteen-way pneumatic fine-tuning mask deformation control subsystem configured to deform a mask, detect a force value of a mask deformation, compare the force value of the mask deformation with an output force set value, and generate a first control feedback quantity to adjust a force deforming the mask, so as to control a deformation quantity of the mask; and an alignment subsystem configured to acquire images of the mask and a substrate, and adjust a position between the mask and the substrate according to the images, so as to align the mask with the substrate. A desired precise mask deformation control may be achieved through a joint control to various subsystems by the control system. Compared with the existing implementation methods, the steps are simpler and the control system is more economically implemented. PCIe channels and independent graphics cards are used in the control system to transmit and process an alignment image signal, thereby improving an efficiency of the subsystems, so that the system may achieve a mask deformation control and alignment more quickly and more accurately.