Vapor Deposition Mask Base Material for Precise Hole Etching
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Solution Overview
Problem
Vapor deposition masks face challenges in achieving dimensional accuracy due to vapor deposition material adhering to the wall surfaces of holes, which reduces the accuracy of patterns formed and complicates the manufacturing process, especially with thinner metal sheets that have varying elongation differences across their width.
Innovation Solution
A vapor deposition mask substrate with an undulated shape along its width direction, where the elongation difference ratios in the center section are less than or equal to 3×10−5 and in the edge sections are less than or equal to 15×10−5, is used to minimize material adherence and enhance pattern accuracy, achieved through specific rolling and etching processes.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If the thickness of the vapor deposition mask is reduced to reduce the areas of the wall surfaces defining holes, then the amount of vapor deposition material adhering to the wall surfaces is reduced and the dimensional accuracy of the pattern is improved, but the permissible range of the duration for which the metal sheet is in contact with the etchant is shortened and the dimensional accuracy of the holes becomes difficult to achieve
Solution Approach 1:
The patent changes the physical parameter of mask thickness to reduce vapor deposition material adherence. By making the mask thinner, the wall surface area is reduced, which decreases the amount of material that adheres to the walls during vapor deposition, thereby improving pattern dimensional accuracy.
Solution Approach 2:
The patent introduces dynamic control of the etching process by adjusting the contact duration between the metal sheet and etchant based on the mask thickness. This allows optimization of the etching process to achieve required hole dimensional accuracy even with thinner masks, resolving the manufacturing difficulty.
2Object-generated harmful factors
If the thickness of the metal sheet is reduced to reduce the thickness of the vapor deposition mask, then the amount of vapor deposition material adhering to the wall surfaces is reduced, but the amount of metal to be etched is reduced and the permissible range of the duration for which the metal sheet is in contact with the etchant is shortened
Solution Approach 1:
The patent changes the parameter of mask thickness to reduce the harmful effect of vapor deposition material adherence. The thinner mask generates less adhesion problem. Simultaneously, the etching parameters are adjusted to compensate for the reduced metal thickness, maintaining manufacturability.
3Ease of manufacture
If the metal sheet has an undulated shape with different elongation difference ratios at different positions, then the metal sheet can be manufactured through rolling or electrolysis, but different positions are brought into contact with the etchant for different durations and the dimensional accuracy of the holes becomes difficult to achieve
Solution Approach 1:
The patent applies local quality control by measuring and characterizing the elongation difference ratios at different positions (center section and edge sections) of the metal sheet. This local characterization allows for position-specific etching duration adjustments to achieve uniform hole dimensional accuracy across the entire sheet despite the undulated shape.
Solution Approach 2:
The patent implements a feedback mechanism where the elongation difference ratios are measured and used to determine the appropriate etching contact duration. This feedback loop allows optimization of the etching process to compensate for the undulated shape and achieve required dimensional accuracy.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach increases the accuracy of patterns formed by vapor deposition by reducing material adherence to the mask substrate's surface, improving the consistency of hole formation and pattern precision, and simplifies the manufacturing process by maintaining the required dimensional accuracy.
Implementation Method 1
The metal sheet has shapes that are taken along a longitudinal direction of the metal sheet at different positions in a width direction of the metal sheet and differ from one another, each of the shapes being an undulated shape including protrusions and depressions repeating in the longitudinal direction of the metal sheet
Implementation Method 2
a technique is used to reduce the thickness of the metal sheet for manufacturing the vapor deposition mask. However, in the process of etching the metal sheet to form holes
Implementation Method 3
The vapor deposition material entering the holes through the second openings forms on the target a pattern corresponding to the position and shape of the first openings
Data Source
AI summary
The ratio of the difference between a surface distance L at each of the different positions in a width direction DW of a metal sheet and a minimum surface distance Lm to the minimum surface distance Lm is an elongation difference ratio. The elongation difference ratio in a center section in the width direction DW of the metal sheet is less than or equal to 3×10−5. The elongation difference ratios in two edge sections in the width direction DW of the metal sheet are less than or equal to 15×10−5. The elongation difference ratio in at least one of the two edge sections in the width direction DW of the metal sheet is less than the elongation difference ratio in the center section in the width direction of the metal sheet.