Mask Blank Film Information Management for Defect Alignment

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Solution Overview

Problem

Conventional techniques for mask blank manufacturing lack accurate defect information management, leading to pattern failures during the writing/development process due to misalignment and lack of correspondence between mask blank and defect information, resulting in increased manufacturing costs and reduced yield.

Innovation Solution

A method is introduced to manage and provide film information for each film in the mask blank, using management numbers and surface form information to ensure accurate alignment and positioning, preventing pattern failures by correlating substrate and film information through reference points, thereby improving manufacturing yield and reducing costs.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Loss of information

If defect information is provided without reference points or direction alignment, then defect data can be supplied to mask makers, but accurate positioning and pattern formation fail due to misalignment between mask blank and defect information

Engineering Contradiction:

Improvedefect information completenessVSAvoiddefect positioning accuracy

Core Design Contradiction:

Loss of informationVSManufacturing precision

Solution Approach 1:

Reference points are introduced as intermediary elements that mediate between the defect information data and the physical mask blank. These reference points serve as a common language that allows defect information to be accurately mapped to the corresponding physical locations on the mask blank, resolving the misalignment problem without requiring complex coordinate transformations or direction tracking systems.

Inventive Principle:

Principle #24Intermediary (Mediator)

Solution Approach 2:

The invention creates a virtual copy of the mask blank's coordinate system and physical layout within the defect information data structure. By embedding reference points that mirror the actual physical reference marks on the mask blank, the system enables precise location mapping without requiring physical tracking of the mask blank through multiple handling operations.

Inventive Principle:

Principle #26Copying

2Productivity

If mask blanks are handled and transferred between containers during manufacturing, then processing can be completed, but direction alignment is lost causing 90, 180, or 270 degree rotations that lead to pattern failure

Engineering Contradiction:

Improvemanufacturing throughputVSAvoidpattern formation reliability

Core Design Contradiction:

ProductivityVSReliability

Solution Approach 1:

Reference points are pre-established on the mask blank before any handling or processing operations. These reference points are permanently marked on the substrate and serve as a persistent directional reference that survives through multiple container transfers and processing steps, allowing the mask blank to be re-oriented correctly at any stage of manufacturing without risking pattern failure.

Inventive Principle:

Principle #10Preliminary action

3Adaptability or versatility

If multiple films are formed on mask blanks with increasing pattern complexity and miniaturization, then higher integration is achieved, but defect levels become stricter and pattern defects increase

Engineering Contradiction:

Improvepattern complexity capabilityVSAvoiddefect tolerance

Core Design Contradiction:

Adaptability or versatilityVSManufacturing precision

Solution Approach 1:

The invention segments the defect information management by film layer, providing separate defect data for each film formed on the mask blank. This allows precise tracking and management of defects in each individual film layer (such as the halftone film, light shielding film, and resist film), enabling targeted quality control measures for each layer while supporting complex multi-film structures required for high integration patterns.

Inventive Principle:

Principle #1Segmentation

Data Source

PatentUS7660456B2Mask fabrication supporting method, mask blank providing method, and mask blank dealing system

Publication Date: 2010.02.09 HOYA CORPORATION

AI summary

A mask blank is provided by forming a plurality of films, including at least a thin film to be a transfer pattern, on a board. At the time of patterning a resist film of the mask blank according to pattern data, film information to check with a pattern is obtained for each of a plurality of the films.