Mask Blank Oxide Layer Thickness Uniformity
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Solution Overview
Problem
The challenge lies in achieving uniform thickness and optical property distribution in mask blanks undergoing heat treatment and forcible cooling, particularly when using a vertical furnace, as natural cooling methods lead to variations in oxide layer thickness and optical properties, affecting transmittance and phase shift performance.
Innovation Solution
The approach involves forming a thin film with a thickness distribution where the central portion is thicker than the outer peripheral portion, and applying a heat treatment followed by forcible cooling in a vertical furnace with a two-layer quartz tube structure to control the oxide layer thickness and oxygen content, ensuring uniform transmittance and phase shift across the mask blank.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of manufacture
If natural cooling is applied after heat treatment in a vertical furnace, then the cooling process is simple, but the oxide layer thickness becomes non-uniform and optical properties vary across the mask blank
Solution Approach 1:
The patent applies forcible cooling immediately after heat treatment to prevent non-uniform oxide layer formation. By actively cooling the mask blank before it is exposed to atmospheric oxygen, the oxidation process is controlled to occur uniformly during the heat treatment stage rather than forming non-uniform oxide layers during natural cooling. This preliminary action (forcible cooling) prevents the harmful effect of non-uniform oxidation that would occur with simple natural cooling.
2Reliability
If heat treatment is applied to improve light resistance and reduce compressive stress, then the film's chemical resistance improves, but the oxide layer thickness becomes non-uniform affecting transmittance uniformity
Solution Approach 1:
The patent combines heat treatment with forcible cooling in a continuous process. The mask blank undergoes heat treatment to achieve the desired chemical resistance and stress relief, followed immediately by forcible cooling to control oxide layer formation. This continuous process ensures that the beneficial effects of heat treatment (improved chemical resistance and reduced compressive stress) are maintained while simultaneously controlling the oxide layer thickness uniformity to ensure transmittance uniformity.
3Productivity
If a vertical furnace is used for batch heat treatment, then productivity increases, but controlling uniform cooling across all substrates becomes difficult
Solution Approach 1:
The patent introduces a cooling gas (inert or reactive gas) as an intermediary medium to achieve uniform cooling across all substrates in the batch. The cooling gas is introduced into the furnace and circulated to ensure consistent cooling conditions for all mask blanks being processed simultaneously. This intermediary cooling gas enables the vertical furnace to maintain both high productivity through batch processing and uniform cooling across all substrates, preventing non-uniform oxide layer formation.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This method enhances the uniformity of transmittance and phase shift distribution, maintaining optical properties within a predetermined range, even after heat treatment and cooling, thereby improving the quality of the mask blank for transfer patterns.
Implementation Method 1
a thin film forming step of forming, on a main surface of a transparent substrate, a thin film by sputtering
Implementation Method 2
a heating step of carrying out a heat treatment for the thin film in a gas containing oxygen
Implementation Method 3
a heating step of carrying out a heat treatment for the thin film in a gas containing oxygen
Implementation Method 4
a cooling step of carrying out a forcible cooling treatment for the mask blank immediately after the heat treatment
Data Source
AI summary
This invention provides a mask blank in which a thin film for transfer pattern formation is provided on a main surface of a transparent substrate. The thin film is made of a material containing a transition metal and silicon and further containing at least one of oxygen and nitrogen. The thin film has as its surface layer an oxide layer with an oxygen content higher than that of a region, other than the surface layer, of the thin film. The thin film is formed so that the thickness of its central portion is greater than that of its outer peripheral portion on the main surface side. The oxide layer is formed so that the thickness of its central portion is greater than that of its outer peripheral portion on the main surface side.


