Mask Cleaning Apparatus Using UV and IR Laser Sequences
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Solution Overview
Problem
Current mask cleaning methods for display device manufacturing, particularly for organic light emitting display devices, face challenges in achieving high light emission efficiency and are costly, environmentally hazardous, and prone to damaging the masks during the cleaning process.
Innovation Solution
A dry mask cleaning apparatus and method using a sequence of preheating, ultraviolet laser irradiation, cooling, and infrared laser irradiation, along with air knife-assisted peeling, to effectively remove organic materials from masks without chemical solvents, allowing for a simpler and cost-effective cleaning process that reduces mask damage and environmental impact.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If conventional mask cleaning methods are used, then cleaning effectiveness is achieved, but mask damage occurs and environmental harm is caused
Solution Approach 1:
The patent replaces conventional mechanical cleaning methods (scrubbing, chemical soaking) with a laser-based cleaning system. The laser beam directly ablates organic materials from the mask surface through photothermal and photomechanical effects, eliminating the need for harsh chemicals and mechanical contact that cause mask damage and environmental pollution.
Solution Approach 2:
The patent utilizes controlled laser parameters (wavelength, pulse duration, power density) to selectively remove organic materials from the mask. By adjusting these parameters, the cleaning process achieves effective removal of contaminants while minimizing thermal damage to the mask substrate, resolving the contradiction between cleaning effectiveness and mask integrity.
2Manufacturing precision
If multiple cleaning zones with different laser beams are used, then cleaning effectiveness is improved, but device complexity increases
Solution Approach 1:
The patent divides the cleaning process into multiple sequential zones: a first cleaning zone with a first laser beam for initial organic material removal, and a second cleaning zone with a second laser beam for residual contaminant elimination. This segmentation allows each zone to be optimized for specific cleaning tasks while maintaining overall system manageability and effectiveness.
Solution Approach 2:
The first cleaning zone performs preliminary cleaning by removing the bulk of organic materials using a laser beam with parameters optimized for high-power ablation. This preliminary action reduces the contaminant load before the mask enters the second cleaning zone, where a different laser beam configuration handles residual contaminants, thereby improving overall cleaning effectiveness without requiring both zones to operate at maximum complexity simultaneously.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution enables efficient and cost-effective cleaning of masks for display device manufacturing, improving the quality of the display devices by reducing chemical usage, lowering operational costs, and enhancing environmental safety while maintaining mask integrity.
Implementation Method 1
a preheating zone configured to preheat a mask
Implementation Method 2
a first ultraviolet cleaning zone configured to irradiate the mask with a first ultraviolet laser beam
Implementation Method 3
irradiate the mask with a first ultraviolet laser beam
Implementation Method 4
irradiate the mask with a first ultraviolet laser beam
Implementation Method 5
a first cooling zone configured to cool the mask irradiated with the first ultraviolet laser beam
Implementation Method 6
an infrared cleaning zone configured to irradiate the mask with an infrared laser beam
Implementation Method 7
irradiate the mask with an infrared laser beam
Implementation Method 8
a peeling zone configured to spray air onto the mask irradiated with the infrared laser beam
Data Source
AI summary
A mask cleaning apparatus and method of using the same includes a preheating zone preheating a mask, a first ultraviolet cleaning zone irradiating the mask with a first ultraviolet laser beam at a first irradiation angle, a first cooling zone cooling the mask irradiated with the first ultraviolet laser beam, a second ultraviolet cleaning zone irradiating the mask with a second ultraviolet laser beam at a second irradiation angle, a second cooling zone cooling the mask irradiated with the second ultraviolet laser beam, an infrared cleaning zone irradiating the mask with an infrared laser beam at a third irradiation angle, and a peeling zone spraying air onto the mask irradiated with the infrared laser beam.