Vapor-Deposition Mask Cleaning via Pyrrolidone Derivatives

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Solution Overview

Problem

Existing methods for cleaning organic substances from manufacturing devices in electro optical devices require manual scrubbing, which is inefficient and costly, and existing apparatus modifications are necessary for chamber-based cleaning methods.

Innovation Solution

A cleaning method using derivatives of pyrrolidone, specifically N-methyl-2-pyrrolidone, to treat manufacturing devices, followed by water and ethanol treatments, allowing for effective removal of organic substances without physical scrubbing or apparatus modification, and utilizing ultrasonic waves for enhanced cleaning.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If manual scrubbing is used to remove organic substances, then cleaning effectiveness is achieved, but labor cost and time consumption increase significantly

Engineering Contradiction:

Improvecleaning effectivenessVSAvoidworking efficiency

Core Design Contradiction:

ReliabilityVSProductivity

Solution Approach 1:

The patent replaces manual mechanical scrubbing with a chemical cleaning system using pyrrolidone derivative. The cleaning solution is applied to the vapor-deposition mask and protection plate, allowing chemical decomposition and removal of organic substances without mechanical friction, thereby eliminating labor while maintaining cleaning effectiveness

Inventive Principle:

Principle #28Mechanics substitution (Replace mechanical system)

Solution Approach 2:

The patent changes the cleaning approach from mechanical force to chemical action by introducing pyrrolidone derivative as a cleaning agent. This parameter change enables automatic cleaning process where the chemical properties of the solution do the work that previously required manual mechanical effort

Inventive Principle:

Principle #35Parameter changes

2Reliability

If chamber-based cleaning methods are used, then organic substances can be removed, but apparatus modification is required increasing cost

Engineering Contradiction:

Improvecleaning effectivenessVSAvoidapparatus modification cost

Core Design Contradiction:

ReliabilityVSEase of manufacture

Solution Approach 1:

The patent extracts the cleaning function from the vapor-deposition chamber and performs it externally. The cleaning solution is applied to the mask and protection plate outside the chamber, eliminating the need to modify the chamber structure while still achieving effective removal of organic substances

Inventive Principle:

Principle #2Taking out (Extraction)

Solution Approach 2:

The patent introduces pyrrolidone derivative as an intermediary cleaning agent that facilitates the removal of organic substances. This intermediary substance enables effective cleaning without requiring structural changes to the existing vapor-deposition apparatus

Inventive Principle:

Principle #24Intermediary (Mediator)

3Productivity

If protection plate is reused without cleaning, then productivity is maintained, but chamber contamination increases

Engineering Contradiction:

Improverepeated use efficiencyVSAvoidchamber contamination

Core Design Contradiction:

ProductivityVSObject-generated harmful factors

Solution Approach 1:

The patent implements a self-service cleaning system where the pyrrolidone derivative cleaning solution automatically removes organic substances from the protection plate and mask. This self-cleaning capability allows the components to be reused multiple times without manual intervention or chamber contamination, maintaining both productivity and cleanliness

Inventive Principle:

Principle #25Self-service

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

Enables efficient and cost-effective removal of organic substances from manufacturing devices, preventing contamination and ensuring accurate vapor-deposition treatments, thereby producing high-quality electro optical devices without the need for manual labor or apparatus modifications.

Implementation Method 1

Derivatives of pyrrolidone utilized for resist removal and so forth are superior in decomposing organic substances

Methodology Applied

Scientific EffectChemical decomposition: Decomposition (biological)

Implementation Method 2

utilizing ultrasonic waves for enhanced cleaning

Methodology Applied

Scientific EffectUltrasonic cleaning: Ultrasonic Vibration

Implementation Method 3

treating the manufacturing device with water

Methodology Applied

Scientific EffectRinsing:

Implementation Method 4

treatment with ethanol allows the water attached to the manufacturing device to be replaced by ethanol. Then, the ethanol, which has a low boiling point, attached to the manufacturing device can be dried rapidly

Methodology Applied

Scientific EffectEvaporation: Evaporation

Data Source

PatentUSRE42248E1Cleaning method, cleaning apparatus and electro optical device

Publication Date: 2011.03.29 ELEMENT CAPITAL COMMERCIAL CO PTE LTD

AI summary

A cleaning apparatus of organic substances attached to a vapor-deposition mask for low molecular weight organic EL devices comprises a first stage for treating a vapor-deposition mask with a derivative of pyrrolidone, a second stage for rinsing the vapor-deposition mask with water, and a third stage for rinsing the vapor-deposition mask with flowing water. The cleaning apparatus also comprises a fourth stage for treating the vapor-deposition mask with ethanol, a fifth stage for drying the vapor-deposition mask, and a carrying means that carries the vapor-deposition mask to each stage in sequence. It is desirable to adopt N-methyl-2-pyrrolidone as the derivative of pyrrolidone.