Mask-Cleaning Apparatus With Wet-Dry Wiping Mechanism
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Solution Overview
Problem
Conventional mask cleaning methods, both manual and automatic, expose workers to hazardous organic solvents and are inefficient, with excessive use of cleaning liquids leading to pollution and ineffective removal of particles and stains.
Innovation Solution
A mask-cleaning apparatus featuring a wet cleaning mechanism with a sprayer and a dry cleaning mechanism using a clean-room wiper system that minimizes solvent use by spraying cleaning liquid onto the wiper, allowing for effective wiping without excessive liquid, ensuring particle removal and preventing water stains.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Quantity of substance
If conventional automatic mask-cleaning apparatuses use a large amount of cleaner liquid based on organic solvent, then cleaning coverage is improved, but pollution and control problems increase
Solution Approach 1:
The patent extracts the cleaning liquid application function from direct spraying onto the mask and instead applies it to the wiper blade through the sprayer mechanism. This extraction allows precise control of liquid quantity while maintaining effective cleaning coverage, reducing overall liquid consumption and associated pollution.
Solution Approach 2:
The wiper blade serves as an intermediary between the sprayer mechanism and the mask surface. Cleaning liquid is sprayed onto the wiper blade rather than directly onto the mask, allowing controlled transfer of minimal liquid to the cleaning surface while achieving thorough particle removal without excessive solvent use.
2Device complexity
If conventional methods use flushing-based cleaning, then cleaning process is simple, but cleaning effectiveness is insufficient for particle removal
Solution Approach 1:
The patent replaces the conventional flushing-based mechanical cleaning system with a wiping mechanism. The wiper blade mechanically contacts and wipes the mask surface, providing superior particle removal effectiveness compared to liquid flushing alone, while the system remains relatively simple in structure.
Solution Approach 2:
The patent changes the cleaning mechanism parameter from liquid flushing to mechanical wiping with controlled liquid application. This parameter change transforms the cleaning action from passive liquid flow to active mechanical contact, significantly improving particle removal effectiveness while maintaining process simplicity.
3Reliability
If workers manually clean masks using cleaner liquid and brushes, then cleaning effectiveness is improved, but worker exposure to hazardous solvents increases
Solution Approach 1:
The patent implements an automated cleaning system where the apparatus performs cleaning operations without human intervention. The robotic arm, wiper mechanism, and sprayer system work autonomously to clean masks, eliminating worker exposure to hazardous solvents while maintaining or improving cleaning effectiveness through consistent automated operation.
Solution Approach 2:
The automated apparatus acts as an intermediary between the cleaning task and human workers. By introducing this intermediate system, the direct contact between workers and hazardous cleaning chemicals is eliminated, protecting worker health while the apparatus performs the effective cleaning function.
4Quantity of substance
If conventional apparatuses use excessive cleaner liquid, then cleaning coverage is ensured, but cost and environmental impact increase
Solution Approach 1:
The patent extracts and controls liquid application to only where needed - on the wiper blade surface rather than liberally applied to the mask. This extraction of liquid to the immediate contact point minimizes overall consumption while ensuring adequate coverage for effective particle removal.
Solution Approach 2:
The patent changes the liquid application parameter from excessive spraying to controlled, minimal dosing through the sprayer mechanism. This parameter optimization reduces solvent consumption while maintaining sufficient liquid presence on the wiper for effective cleaning, lowering both cost and environmental impact.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The apparatus provides a safe, environmentally friendly, and cost-effective cleaning process that effectively removes particles and stains from masks without leaving water marks, enhancing production yield and quality while reducing solvent consumption.
Implementation Method 1
The sprayer mechanism is adapted for spraying cleaning liquid onto the portion of the clean-room wiper on the pushing roller
Implementation Method 2
The wet cleaning mechanism wipes a mask before the dry cleaning mechanism wipes the mask
Implementation Method 3
a dry cleaning mechanism using a clean-room wiper system that minimizes solvent use by spraying cleaning liquid onto the wiper, allowing for effective wiping without excessive liquid, ensuring particle removal and preventing water stains
Data Source
AI summary
A mask-cleaning apparatus includes a frame, a wet cleaning mechanism supported on the frame, and a dry cleaning mechanism supported on the frame and located after the wet cleaning mechanism in a direction of feeding a clean-room wiper. The wet cleaning mechanism wipes a mask before the dry cleaning mechanism wipes the mask. Each of the wet and dry cleaning mechanisms includes a wiping module that includes a vertical plate, a feeder reel, a retriever reel, direction-changing rollers and a pushing roller. The wiping module of the wet cleaning mechanism includes a sprayer mechanism adapted for spraying cleaning liquid onto a portion of the clean-room wiper on the pushing roller.