Mask Data Preparation Corner Metadata Propagation
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Current lithography systems face challenges in replicating precise patterns on masks due to finite resolution and loss of critical design data during the pattern generation process, leading to compromised corner sharpness and fidelity.
Innovation Solution
The solution involves propagating refined design data information by combining corner metadata with the image, distinguishing between true and false corners, and using this metadata to enhance corner precision and focus computing power on critical areas, thereby improving pattern replication fidelity.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of manufacture
If the design pattern data is fractured into primitive geometries for processing, then the pattern can be printed on the substrate, but the relationship between primitive geometries and the shapes they form is lost, compromising corner precision
Solution Approach 1:
The patent segments the design pattern data into two distinct data streams: fractured primitive geometry data for printing and unfractured metadata containing corner information. This segmentation allows the printing system to process geometries while preserving corner precision information separately, resolving the contradiction between manufacturability and precision.
Solution Approach 2:
The patent introduces metadata as an intermediary carrier that transports corner information from the design stage through the printing process. This metadata acts as a mediator that bridges the gap between the fractured geometries needed for printing and the original corner precision requirements, enabling both objectives to be achieved simultaneously.
2Manufacturing precision
If corner enhancement functions are applied to improve corner sharpness, then corner precision may be improved, but computing resources are consumed across the entire pattern rather than focusing on critical areas
Solution Approach 1:
The patent applies local quality by using metadata to identify and prioritize specific corners that require enhancement. Instead of uniformly processing all corners, the system focuses computing resources on critical corners identified through the metadata, thereby improving corner sharpness where needed while minimizing unnecessary computational energy consumption.
Solution Approach 2:
The patent implements partial action by applying corner enhancement functions selectively only to corners identified as critical through metadata analysis. This avoids the excessive application of enhancement to all corners uniformly, optimizing the balance between achieving necessary corner precision and conserving computational resources.
3Productivity
If the writer system processes large amounts of primitive geometries, then the complete pattern can be generated, but the system has relatively little understanding of the pattern and cannot distinguish critical from non-critical areas
Solution Approach 1:
The patent applies preliminary action by preparing and attaching metadata to the design pattern data before the writing process begins. This metadata contains corner information and design significance data that guide the writer system's processing, enabling the system to understand and prioritize critical areas without sacrificing overall pattern generation productivity.
Solution Approach 2:
The patent implements feedback by using metadata to provide continuous guidance to the writer system throughout the pattern generation process. The metadata feedback loop ensures that the writer system maintains understanding of design significance while processing primitive geometries, preventing information loss and enabling intelligent processing decisions.
Data Source
AI summary
In a pattern generation method, properties of designs are extracted in a mask data preparation system, and the properties are propagated to a lithography write system. A pattern is generated based on fractured design data and the extracted properties. By preserving the design intent to the lithography write system, the fidelity of the pattern replication may improve.