Photolithography Mask Design Rule Checker Automation
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Solution Overview
Problem
The complexity of design rule sets in semiconductor wafer-fabrication processes, particularly in deep sub-100 nanometer technologies, leads to computationally intense and tedious tasks for layout engineers in identifying and resolving design rule violations, making it difficult to tailor mask sets for specific semiconductor-wafer fabrication facilities.
Innovation Solution
A computer-implemented method using a design-rule checker in combination with a list of solutions to efficiently identify and resolve design rule violations by comparing geometric dimensions of features on a photolithography mask against a set of design rules, presenting applicable solutions to the user, and updating the design file to conform to the rules.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If design rule sets are made comprehensive to cover all geometric restrictions for tailored mask sets, then manufacturing precision is improved, but device complexity increases due to tens of thousands of design rules
Solution Approach 1:
The patent segments the comprehensive design rule set into modular rule categories (e.g., spacing rules, enclosure rules, width rules) that can be independently checked and applied. This segmentation allows the system to manage tens of thousands of design rules by organizing them into structured groups, reducing the perceived complexity while maintaining comprehensive coverage for manufacturing precision.
Solution Approach 2:
The patent introduces an intermediary design rule checking system that acts as a mediator between the complex design rule set and the mask layout engineer. This intermediary automatically checks compliance with geometric restrictions, translating the complexity of tens of thousands of rules into simplified violation reports and suggestions, thereby maintaining manufacturing precision without burdening the engineer with rule complexity.
2Manufacturing precision
If comprehensive design rule checking is performed to ensure compliance with all geometric restrictions, then manufacturing precision is improved, but productivity decreases due to computationally intense tasks
Solution Approach 1:
The patent implements preliminary design rule checking during the mask design process itself, rather than performing comprehensive checking only after design completion. This preliminary action identifies and flags potential violations early, allowing engineers to correct issues incrementally as they design, thereby maintaining manufacturing precision while improving productivity by avoiding rework.
Solution Approach 2:
The patent incorporates real-time feedback mechanisms where the design rule checking system continuously monitors design compliance and provides immediate feedback to the engineer. This feedback loop allows for iterative correction of violations during the design process, ensuring manufacturing precision is maintained while improving productivity through guided design rather than post-design verification.
3Ease of operation
If layout engineers manually review and resolve design rule violations, then ease of operation is maintained, but loss of time increases due to tedious searching and review of available solutions
Solution Approach 1:
The patent implements a self-service mechanism where the design rule checking system automatically generates and presents suggested solutions for violations to the engineer. Instead of requiring the engineer to manually search through available solutions, the system autonomously identifies applicable solutions based on the violation type and presents them for review, thereby reducing violation resolution time while maintaining engineer control over the final design decisions.
Solution Approach 2:
The patent replaces the manual mechanical process of searching and reviewing solutions with an automated computational system. The design rule checking software automatically analyzes violations, queries solution databases, and presents relevant solutions to the engineer. This substitution eliminates the tedious manual searching process while preserving engineer oversight, significantly reducing loss of time without sacrificing ease of operation.
Data Source
AI summary
The present disclosure describes apparatuses and methods for correcting design rule violations. The apparatuses and methods, applicable to the design of features to be rendered onto a photolithography mask used in a semiconductor wafer-manufacturing environment, rely on a design-rule checker working in combination with a list of one or more solutions. The combination of the design-rule checker working with the list of one or more solutions provides for efficient and effective identification and resolution of design rule violations.