Mask Plate Detection Marks for Exposure Defect Diagnosis
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Solution Overview
Problem
Conventional exposure technologies fail to accurately detect exposure defects in the fabrication of Liquid Crystal Displays (LCDs), leading to uneven exposure amounts due to improper parameter settings, which cannot be determined by existing detection methods.
Innovation Solution
A mask plate with detection-mark mask patterns arranged along the scan direction of an exposure machine, forming detection marks on the substrate to reflect exposure defects, allowing for the identification of defects through deformation analysis.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If conventional exposure detection technology is used, then the exposure process can be completed, but exposure defects cannot be accurately detected or diagnosed
Solution Approach 1:
The patent applies preliminary action by pre-arranging detection-mark mask patterns on the mask plate before exposure. These patterns are positioned at specific locations (edges, corners, or distributed across the mask plate) and exposed along with the main pattern. After exposure and development, the resulting detection marks serve as reference indicators for diagnosing exposure defects, enabling accurate identification of beam motion issues before they affect the main substrate area.
Solution Approach 2:
The detection-mark mask patterns act as an intermediary between the exposure machine's beam motion and the substrate. By observing how the beam exposes these known patterns, one can infer the beam's motion characteristics (uniform velocity, acceleration, deceleration) and diagnose exposure defects without directly measuring the beam itself. The detection marks mediate the information about beam motion quality.
2Manufacturing precision
If the beam scans the substrate with uniform velocity, then exposure quality is maintained, but beam motion control complexity increases
Solution Approach 1:
The patent implements feedback by using the detection marks as visual indicators of beam motion quality. After exposure, the detection marks are examined to determine whether the beam maintained uniform velocity, accelerated, or decelerated during scanning. This feedback information about beam motion characteristics allows operators to adjust exposure machine parameters to achieve better uniformity in future exposure runs.
3Reliability
If detection-mark mask patterns are added to the mask plate, then exposure defect detection capability is improved, but mask plate design complexity increases
Solution Approach 1:
The patent applies segmentation by dividing the mask plate into functional zones: the main pattern area for substrate fabrication and the detection-mark area for quality monitoring. The detection-mark mask patterns are segregated into specific regions (edges, corners, or distributed zones) distinct from the main pattern. This segmentation allows the detection function to be added without complicating the main pattern design, as the two functions are spatially separated and independently designed.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables precise determination of exposure defects, improving exposure effects and substrate parameter indexes by identifying and addressing the root causes of defects in the exposure process.
Implementation Method 1
an arc beam (or beams in other forms) with an initial acceleration velocity of zero is emitted by the exposure machine
Implementation Method 2
the substrate is coated with a photosensitive substance thereon
Data Source
AI summary
Embodiments of the invention disclose a mask plate and a method for detecting an exposure defect using the mask plate. The mask includes a mask pattern, and the mask further includes a plurality of detection-mark mask patterns arranged along a scan direction of an exposure machine, the detection-mark mask patterns are arranged at an edge of the mask pattern. The detection-mark mask patterns are adapted for forming detection marks on a substrate. The detection marks are adapted for reflecting exposure defects of the exposure machine. With the mask plate of the invention, the reason for the exposure defect may be precisely decided, thereby improving the exposure effect and improving the parameter index of the substrate.