Photolithographic Mask Error Correction via Joint Optimization
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Solution Overview
Problem
Photolithographic masks face challenges in correcting errors such as planarity deviations, optical transmission homogeneity, and pattern element placement errors, which affect the fabrication of semiconductor devices, especially with the increasing complexity and cost of manufacturing masks for smaller wavelengths like EUV.
Innovation Solution
A method that optimizes both imaging transformation parameters and laser beam parameters simultaneously to correct errors in photolithographic masks, using a joint optimization process that includes varying imaging and laser beam parameters to minimize overall errors, and establishes a relation between laser beam parameters and their effects on the mask substrate to correct multiple types of errors in a single process.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If traditional separate optimization methods are used for imaging parameters and laser beam parameters, then the correction process is simpler, but the overall error reduction is insufficient
Solution Approach 1:
The patent combines the optimization of imaging parameters and laser beam parameters into a single joint optimization process. The objective function simultaneously considers both parameter types, allowing them to be optimized together rather than separately, which achieves better overall error reduction while managing complexity through unified formulation.
Solution Approach 2:
The patent transforms the correction problem into a parameter optimization problem where imaging parameters and laser beam parameters are adjusted to minimize an objective function. This mathematical transformation allows systematic exploration of the parameter space to achieve optimal error correction.
2Manufacturing precision
If multiple types of errors are corrected in separate processes, then each correction can be optimized independently, but the total number of process steps increases and may introduce new errors
Solution Approach 1:
The patent merges the correction of registration errors, optical transmission errors, and planarity errors into a single integrated process. By simultaneously optimizing imaging parameters and laser beam parameters, multiple error types are corrected in one operation, improving throughput while maintaining high correction accuracy through the unified objective function.
3Manufacturing precision
If the optimization space is limited to traditional parameters, then the correction process is more manageable, but the error reduction capability is insufficient
Solution Approach 1:
The patent expands the optimization space by adding laser beam parameters (energy, pulse duration, focal position) to the traditional imaging parameters. This dimensional expansion creates a more comprehensive parameter space that enables better error reduction, while the structured objective function manages the increased complexity through systematic optimization.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach significantly reduces overall errors in photolithographic masks, increasing the yield of the mask fabrication process by expanding the optimization space and allowing for the simultaneous correction of registration, optical transmission, and planarity errors without introducing new errors.
Implementation Method 1
locally directing the laser beam onto the photolithographic mask using optimized second parameters
Implementation Method 2
applying an imaging transformation using optimized first parameters
Data Source
AI summary
A method for correcting a plurality of errors of a photolithographic mask is provided. First parameters of a imaging transformation of the photolithographic mask and second parameters of a laser beam locally directed onto the photolithographic mask are optimized, and the plurality of errors are corrected by applying an imaging transformation using optimized first parameters and locally directing the laser beam onto the photolithographic mask using optimized second parameters. The first and the second parameters are simultaneously optimized in a joint optimization process.