Deposition Mask Frame Support for Flatness and Alignment Control
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Solution Overview
Problem
The quality of images displayed by display apparatuses is compromised due to inaccuracies in disposing the intermediate layer with a pattern shape on a substrate, which is related to the transformation issues of the mask assembly during the manufacturing process.
Innovation Solution
An apparatus and method for manufacturing a mask with a reduced transformation of the mask assembly, featuring a stage body tilted with respect to the gravitational direction, a contact portion with a magnet that exhibits no magnetism when current flows through it, and a moving portion with elastic bodies to apply force and move the contact portion, ensuring precise alignment and flatness of the mask frame.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If the mask assembly is used to form the intermediate layer having a pattern shape, then the intermediate layer can be disposed on the substrate, but transformation of the mask assembly occurs leading to inaccurate positioning
Solution Approach 1:
The support structure is divided into multiple support parts that can independently adjust and apply force to different regions of the mask frame. This segmentation allows localized compensation for mask transformation without affecting the entire mask assembly, thereby maintaining positioning accuracy while accommodating mask deformation.
Solution Approach 2:
The support parts can change their support parameters (position, force, orientation) dynamically during the deposition process. By adjusting these parameters, the system compensates for mask assembly transformation and maintains the mask frame in the correct position and orientation for accurate intermediate layer deposition.
2Manufacturing precision
If the mask frame is held rigid to maintain flatness, then positioning accuracy is improved, but the mask assembly undergoes transformation due to gravitational and process forces
Solution Approach 1:
The support structure transitions from a static rigid support to a dynamic adaptive support system. The support parts can move and adjust their positions dynamically during the deposition process, allowing the mask frame to maintain flatness while accommodating transformation forces through controlled movement rather than rigid resistance.
Solution Approach 2:
The support parts apply counter-forces to balance the gravitational and process forces acting on the mask assembly. By providing opposing forces through the support structure, the system prevents mask transformation while maintaining the required flatness for accurate deposition.
3Manufacturing precision
If the contact portion uses magnet to hold the mask frame, then positioning is improved, but the magnet loses magnetism when current flows through it
Solution Approach 1:
The magnetic holding force is applied periodically rather than continuously. The magnet is activated only when needed for positioning the mask frame, and deactivated when current flows through it (which temporarily reduces magnetism). This periodic activation pattern allows the system to maintain positioning accuracy while accommodating the temporary loss of magnetic force during current flow.
Solution Approach 2:
The system uses an intermediary mechanism (the support parts with multiple support points) to maintain mask frame positioning during periods when the magnetic force is reduced or lost. The support structure acts as a mediator that can hold the mask frame in position even when the magnet is not fully active, ensuring continuous positioning reliability.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution improves the deposition quality by minimizing transformation of the mask assembly, maintaining the mask frame's flatness, and ensuring precise deposition of the pattern on the substrate, enhancing the accuracy and precision of the displayed images.
Implementation Method 1
The contact portion may include a magnet. The magnet of the contact portion may be configured to exhibit no magnetism while a current flows therethrough.
Implementation Method 2
The moving portion may include an elastic body corresponding to at least one of moving directions of the contact portion and may be configured to exhibit an elastic force to the contact portion.
Implementation Method 3
a stage body portion tilted with respect to a gravitational direction and configured to receive a mask frame having opening sits thereon
Data Source
AI summary
An apparatus for manufacturing a mask is provided. The apparatus includes: a stage body portion tilted with respect to a gravitational direction and configured to receive a mask frame having opening sits thereon; a contact portion protruding from one surface of the stage body portion toward the mask frame; and a moving portion configured to move the contact portion.