Mask Frame Alignment Hole Curvature Prevents Liquid Residuals
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Solution Overview
Problem
Liquid residuals in the alignment holes of a mask frame assembly interfere with the alignment process during the evaporation of OLED display panels, leading to alignment failures and alarm signals in the evaporation apparatus.
Innovation Solution
The mask frame assembly incorporates alignment marks with a first alignment hole in the frame and a second alignment hole in the mask plate, where the first alignment hole is designed as a through hole or blind hole with specific geometric features to prevent liquid residuals from accumulating at the deepest position, ensuring effective discharge and recognition of alignment marks during the alignment process.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Device complexity
If the first alignment hole is designed as a blind hole with a deepest position, then the alignment mark structure is simplified, but liquid residuals accumulate at the deepest position and interfere with alignment
Solution Approach 1:
The first alignment hole is designed with a curved bottom surface instead of a sharp deepest position. The curvature radius is specifically controlled to prevent liquid residuals from accumulating at the bottom, while maintaining the blind hole structure for simplified alignment mark design. This curved geometry allows liquid to flow away from the bottom rather than pooling there.
2Object-affected harmful factors
If the first alignment hole is designed as a through hole, then liquid residuals are discharged effectively, but the frame structure becomes more complex and requires additional processing
Solution Approach 1:
Instead of creating a through hole which would require penetrating the entire frame thickness, the patent uses a blind hole with a curved bottom surface. This curvature prevents liquid accumulation while avoiding the need for complete through-hole processing, thus reducing frame structure complexity and processing difficulty.
3Measurement precision
If the alignment hole deepest position overlaps with the orthographic projection of the second alignment hole, then the alignment mark recognition is enhanced, but liquid residuals at the deepest position cause alignment failure
Solution Approach 1:
The curved bottom surface of the first alignment hole prevents liquid residuals from accumulating at positions that would overlap with the orthographic projection of the second alignment hole. This maintains clear alignment mark recognition while avoiding liquid-induced alignment failures.
Solution Approach 2:
The patent extracts the problematic element (liquid residual accumulation) by designing the hole geometry such that the deepest position does not overlap with the projection of the second alignment hole. This separates the liquid accumulation zone from the alignment recognition zone, eliminating the harmful effect.
Data Source
AI summary
A mask frame assembly and an evaporation apparatus are disclosed. The mask frame assembly comprises a frame and a mask plate fixed on the frame. The mask frame assembly is provided with alignment marks, which comprise a first alignment hole arranged in the frame and a second alignment hole arranged in the mask plate. The first alignment hole is a through hole. The mask frame assembly effectively solves a problem in which liquid residuals in alignment holes of the frame interfere with alignment.