Mask Frame Support Bar Layout for Precise Display Deposition

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Solution Overview

Problem

The manufacturing process of display apparatuses faces challenges due to deformation of support bars during pixel position accuracy detection, leading to lower deposition precision and potential defects in the display units.

Innovation Solution

A mask frame assembly with a support bar featuring symmetrical first and second holes of different widths is used, which reduces deformation by dispersing tensile forces and maintains deposition material accuracy.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Measurement precision

If an opening is provided on one side of the support bar to detect pixel position accuracy, then measurement capability is improved, but the support bar deforms due to the opening causing lower deposition precision

Engineering Contradiction:
Improvepixel position accuracy detectionVSAvoiddeposition precision
Core Design Contradiction:
Measurement precisionVSManufacturing precision

Solution Approach 1:

The patent applies asymmetry by providing openings of different widths at different positions on the support bar. Specifically, a first opening with a first width is provided at a first position, and a second opening with a second width (different from the first width) is provided at a second position. This asymmetric design compensates for the deformation caused by the openings while maintaining the measurement capability, thereby resolving the contradiction between measurement precision and manufacturing precision.

Inventive Principle:
Principle #4Asymmetry

2Measurement precision

If the support bar is extended with an opening for PPA detection, then pixel position accuracy measurement is enabled, but deformation occurs leading to shadow effects on substrate

Engineering Contradiction:
ImprovePPA detection capabilityVSAvoidshadow effects on substrate
Core Design Contradiction:
Measurement precisionVSObject-affected harmful factors

Solution Approach 1:

The asymmetric opening design allows the support bar to maintain its structural integrity while enabling PPA detection. By strategically positioning openings of different widths, the design minimizes deformation that would otherwise cause shadow effects on the substrate, thus eliminating the harmful factor while preserving the measurement capability.

Inventive Principle:
Principle #4Asymmetry

Solution Approach 2:

The patent applies local quality by making different parts of the support bar have different properties - specifically, openings of different widths at different positions. This localized variation in structure allows the support bar to have different stiffness characteristics at different locations, enabling it to resist deformation in critical areas while still allowing for PPA detection.

Inventive Principle:
Principle #3Local quality

Data Source

PatentUS9997708B2Mask frame assembly, apparatus and method for manufacturing a display apparatus
Publication Date: 2018.06.12 SAMSUNG DISPLAY CO LTD
  • US9997708B2 patent drawing
  • US9997708B2 patent drawing
  • US9997708B2 patent drawing

AI summary

A mask frame assembly includes a frame having an opening, a support bar extended in a first direction crossing the opening of the frame and having distal ends installed over the frame, and a mask having extended in a second direction crossing the first direction, having distal ends installed over the frame, and having a pattern unit extended along the second direction and configured to pass a deposition material. The support bar includes a first opening disposed on one side of the support bar and having a first width in the second direction, and a second opening disposed on the other side of the support bar opposite to the one side of the support bar and having a second width greater than the first width in the second direction.