Vertical Vapor Deposition Mask Frame Deflection Correction
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Solution Overview
Problem
In vertical vapor deposition processes for organic EL display devices, the deflection of vapor deposition masks due to their own weight can lead to deposition defects, such as misalignment and color mixture of pixels, reducing manufacturing yield.
Innovation Solution
A vapor deposition method that includes a correction mechanism to address the deflection of the mask frame by applying a force in the direction opposite to the deflection, using a control mechanism to specify the magnitude of deflection and correct it, ensuring precise alignment and deposition.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Area of stationary object
If a vertical vapor deposition apparatus is used to process large substrates, then the occupied area of the apparatus is reduced, but mask deflection due to gravity causes deposition defects
Solution Approach 1:
A support structure is introduced to counteract the gravitational force acting on the mask frame. The support structure provides upward force to balance the weight of the mask frame, preventing deflection and maintaining deposition alignment precision while enabling vertical apparatus configuration.
Solution Approach 2:
The mask frame is pre-supported before the vapor deposition process begins. By installing the support structure in advance and adjusting it to bear the mask frame's weight, the system prevents deflection from occurring during deposition, ensuring alignment is maintained throughout the process.
2Area of stationary object
If the mask frame is made larger to accommodate large substrates, then processing capability is improved, but deflection due to own weight increases
Solution Approach 1:
The support structure is designed to counteract gravity's effect on the enlarged mask frame. By positioning supports at strategic locations and adjusting their force, the system compensates for the increased weight and moment of inertia, maintaining mask frame flatness despite the larger size required for processing big substrates.
Solution Approach 2:
The support structure is divided into multiple support points distributed across the mask frame. This segmentation allows localized support at critical areas, preventing overall deflection while accommodating the large substrate area. Each support point independently counteracts gravitational effects on its section of the mask frame.
3Manufacturing precision
If the mask frame is fixed rigidly to prevent deflection, then alignment precision is improved, but the complexity of the apparatus increases
Solution Approach 1:
Instead of rigid fixation, the support structure is designed to be adjustable and adaptive. The supports can be positioned and adjusted to match the specific weight distribution and deflection characteristics of different mask frames, providing optimal support with minimal structural complexity. This dynamic approach replaces complex rigid constraints with simpler adaptive support.
Solution Approach 2:
The support structure is designed to automatically adapt to the mask frame's weight and dimensions. By incorporating adjustable elements that can be tuned to match the specific mask frame being used, the system achieves precise alignment support without requiring complex pre-engineered rigid structures for each possible mask frame configuration.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The method effectively suppresses deposition failures caused by mask deflection, maintaining the accuracy and quality of the light-emitting layers in organic EL display devices, thereby improving manufacturing yield and pixel alignment.
Implementation Method 1
A thin film is formed by applying heat to the organic EL material to evaporate it and depositing the evaporated organic EL material on a substrate
Implementation Method 2
a vapor deposition method for depositing a vapor deposition material on a substrate using a mask
Data Source
AI summary
A vapor deposition method for depositing evaporated materials on a substrate using a mask includes arranging a mask frame and correcting a deflection of the mask frame in the direction of gravity after the mask frame is placed. The mask frame faces the substrate so that a first side is higher than a second side in a direction of gravity. The mask frame is provided with a mask and has the first side and the second side facing each other.