Mask Frame Vacuum Suction for OLED Pattern Protection
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Existing methods for fixing masks on mask frames during the fabrication of large-sized organic electroluminescent devices often damage the fine patterns on the masks due to the use of weight bars, leading to increased worker burden and production costs from mask scrapage.
Innovation Solution
A mask frame design featuring a through opening and a base with discharging holes for vacuum suction, allowing the mask to be securely attached without physical weights, thereby protecting the pattern area from damage during welding.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Strength
If weight bars are used to secure the mask during welding, then the mask can be firmly fixed on the mask frame, but the fine patterns on the mask may be damaged
Solution Approach 1:
The patent replaces the mechanical weight bar system with a vacuum suction system. Instead of using physical weights to hold down the mask, the invention uses vacuum pressure applied through holes in the base to secure the mask edge to the mask frame, thereby eliminating the harmful mechanical contact that damages patterns
Solution Approach 2:
The patent employs pneumatic principles by using vacuum suction through holes in the base to create negative pressure that holds the mask edge against the mask frame. This pneumatic mechanism provides firm fixation without requiring physical weight bars that would contact and damage the mask patterns
2Strength
If weight bars are used to hold down the mask, then the mask can be secured during welding, but worker burden increases due to manual handling
Solution Approach 1:
The patent replaces the manual mechanical system of placing and adjusting weight bars with an automated vacuum suction system. The vacuum pump automatically secures the mask through the holes in the base, eliminating the need for workers to manually handle weight bars and reducing operational burden
Solution Approach 2:
The vacuum suction system is self-activating once the mask is positioned. The vacuum pump automatically creates negative pressure to secure the mask edge, requiring no manual intervention to adjust or position weight bars, thereby reducing worker burden
3Strength
If traditional welding fixation is used, then the mask can be firmly attached, but mask scrapage increases due to pattern damage
Solution Approach 1:
The patent replaces the damaging mechanical weight bar system with vacuum suction that contacts only the mask edge through the holes in the base. This substitution maintains firm attachment strength during welding while preventing contact with and damage to the pattern areas, thereby reducing mask scrapage
Solution Approach 2:
The vacuum suction system applies holding force only at specific locations (the mask edge at the base) rather than across the entire mask surface. This localized application of vacuum pressure through the holes in the base provides sufficient fixation for welding without contacting or damaging the pattern areas
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The vacuum suction method effectively secures the mask to the frame without damaging the pattern, reducing worker burden and production costs by preventing mask damage during the fixation process.
Implementation Method 1
a base corresponding to the mask edge, wherein the base is formed with discharging holes through which air is discharged
Data Source
AI summary
A mask frame on which a mask, having a pattern area and a mask edge defining the pattern area, is fixed comprises: a through opening corresponding to the pattern area; and a base corresponding to the mask edge. The base is provided with discharging holes formed therein, and a vacuum pump is coupled to the discharging holes so that the mask is fixed to the mask frame without damaging the pattern formed on the pattern area of the mask.