Mask Pattern Frequency Control for Inkjet Beading Reduction

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Solution Overview

Problem

Ink jet printing systems face issues with beading due to interference between block patterns and masks when using multiple nozzle arrays for the same color, leading to poor dot dispersibility and image quality degradation.

Innovation Solution

A data processing apparatus and method that perform mask processing to divide dot data into multiple scanning passes, using mask patterns with specific frequency characteristics to reduce interference between nozzle arrays, ensuring fewer low-frequency components and no peaks in the low-frequency region, thereby improving dot dispersibility and reducing beading.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Productivity

If multiple nozzle arrays are used for the same color to increase printing speed, then productivity is improved, but beading occurs due to interference between block patterns and masks

Engineering Contradiction:
Improveprinting speedVSAvoidbeading
Core Design Contradiction:
ProductivityVSObject-generated harmful factors

Solution Approach 1:

The patent changes the frequency characteristics parameters of the mask pattern by controlling the ratio of high-frequency components to low-frequency components. Specifically, it ensures that the ratio of integrated power in the high-frequency region to that in the low-frequency region is within a predetermined range, thereby reducing beading while maintaining high printing speed with multiple nozzle arrays

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The patent dynamically adjusts the mask pattern's frequency characteristics based on the driving pattern of the nozzle arrays. By making the mask pattern adaptable to the specific blocking pattern used for distributing dot data across multiple nozzle arrays, it optimizes dot dispersibility and reduces beading in high-speed printing

Inventive Principle:
Principle #15Dynamics

2Manufacturing precision

If mask processing is performed to divide dot data into multiple scanning passes, then dot dispersibility is improved, but interference between mask and block patterns causes beading

Engineering Contradiction:
Improvedot dispersibilityVSAvoidbeading
Core Design Contradiction:
Manufacturing precisionVSObject-generated harmful factors

Solution Approach 1:

The patent modifies the frequency parameters of the mask pattern to reduce interference with the block pattern. By controlling the ratio of high-frequency to low-frequency components, it achieves better dot dispersibility across multiple nozzle arrays while minimizing the beading effect caused by pattern interference

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The patent uses the frequency characteristics of the mask pattern as an intermediary parameter to mediate between the block pattern's dot data distribution requirements and the need for smooth ink deposition. This intermediary approach allows both patterns to coexist without causing beading

Inventive Principle:
Principle #24Intermediary (Mediator)

3Object-generated harmful factors

If low-frequency components are reduced in the mask pattern, then beading is reduced, but printing speed may be affected

Engineering Contradiction:
ImprovebeadingVSAvoidprinting speed
Core Design Contradiction:
Object-generated harmful factorsVSProductivity

Solution Approach 1:

The patent precisely controls the frequency distribution parameters of the mask pattern, ensuring that while low-frequency components are reduced to minimize beading, the overall printing speed is maintained. It achieves this by optimizing the ratio of high-frequency to low-frequency components within specific ranges

Inventive Principle:
Principle #35Parameter changes

Data Source

PatentUS7469985B2Data processing apparatus, printing apparatus and method of creating mask
Publication Date: 2008.12.30 CANON KK
  • US7469985B2 patent drawing
  • US7469985B2 patent drawing
  • US7469985B2 patent drawing

AI summary

Beading caused by interferences between block patterns, which are driving patterns of two nozzle arrays at the time of printing with the use of the two nozzle arrays for the same color, and a mask is reduced. Specifically, when the mask is created, repulsive potentials are calculated between the mask and planes with the block patterns. That is, when a placement of a print permitting area in the mask is determined, the repulsive potentials are calculated between the mask and dots in the planes with the block patterns, and then the print permitting area is placed on the most dispersive position with the lowest energy. This allows the print permitting areas to be well dispersed in terms of the overlaps between the block patterns and the mask.