Gripper System for Mask Positioning in Charged Particle Beam Imaging
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Solution Overview
Problem
Existing patterning device handling apparatuses for charged particle beam imaging lack flexibility and efficiency in moving and positioning masks at various angles, particularly for non-circular shapes like masks used in semiconductor lithography, which limits the effectiveness of SEM inspections.
Innovation Solution
A patterning device handling apparatus with a gripper system comprising first and second gripping members equipped with positioning projections, a gripping force provider for precise movement along a straight track, and sensors for angle and gripping status detection, allowing the apparatus to securely hold and position masks at different angles.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If a conventional handling apparatus is used to move masks, then the mask can be transferred between chambers, but the apparatus lacks flexibility and efficiency in positioning masks at various angles
Solution Approach 1:
The gripper system employs movable gripping members that can dynamically adjust their positions and angles. The first and second gripping members are capable of independent movement along tracks, allowing the mask to be secured and positioned at various angles (including 0°, 45°, 90°, and 135°) efficiently, thus resolving the contradiction between adaptability and productivity
2Reliability
If positioning projections are added to grip non-circular masks at different angles, then mask holding capability improves, but the device complexity increases
Solution Approach 1:
The gripper is divided into separate functional components: a first gripping member with first positioning projections and a second gripping member with second positioning projections. Each gripping member can be independently controlled and positioned, allowing flexible combination to achieve various masking angles without requiring a completely complex reconfiguration of the entire device
Solution Approach 2:
The positioning projections on both gripping members are designed to be universally applicable for different mask orientations. The same first and second positioning projections can accommodate masks at multiple angles through the coordinated movement of the gripping members along their tracks, reducing the need for multiple specialized components
Data Source
AI summary
A patterning device handling apparatus for use in charged particle beam imaging is disclosed. The disclosed patterning device handling apparatus comprises a first gripping member and a second gripping member. The first gripping member is equipped with a plurality of first positioning projections, and the second gripping member is equipped with a plurality of second positioning projections. When the patterning device is held at one angle, the first positioning projections abut against one edge of the patterning device and the second positioning projections abut against the opposite edge of the patterning device. When the patterning device is held at another angle, the first positioning projections abut against two neighboring edges of the patterning device, and the second positioning projections abut against the other two neighboring edges of the patterning device. Therefore, the disclosed patterning device handling apparatus can hold the pattering device at different angles.