Mask Layer Imaging with Sampling Patterns for Ink Distribution

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Solution Overview

Problem

Existing methods for imaging a mask layer in printing technology face issues such as insufficient ink density, trailing edge voids, and interference from sampling patterns in solid and halftone areas, which affect printing quality.

Innovation Solution

A method involving different imaging settings for solid and halftone areas, with a sampling pattern applied to solid areas to enhance ink distribution and prevent interference, using resolutions between 1000 dpi to 2540 dpi, and varying imaging settings based on tonal values to optimize surface structures.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If a sampling pattern is applied on solid area to improve ink distribution, then trailing edge voids are reduced, but interference with halftone area pattern increases

Engineering Contradiction:

Improveink distribution uniformityVSAvoidpattern interference

Core Design Contradiction:

Manufacturing precisionVSObject-affected harmful factors

Solution Approach 1:

The patent applies different imaging settings to different areas of the mask layer. Specifically, a sampling pattern is applied only to solid areas to improve ink distribution, while halftone areas are imaged without sampling pattern to avoid interference. This local differentiation resolves the contradiction by tailoring the imaging approach to the specific requirements of each area.

Inventive Principle:

Principle #3Local quality

Solution Approach 2:

The patent segments the image file into solid areas and halftone areas, applying different imaging settings to each segment. This segmentation allows the sampling pattern to be applied selectively only where needed (in solid areas) while avoiding its application in halftone areas where it would cause interference.

Inventive Principle:

Principle #1Segmentation

2Manufacturing precision

If sampling pattern resolution is increased to reduce trailing edge voids, then ink density improves, but manufacturing complexity increases

Engineering Contradiction:

Improvetrailing edge void reductionVSAvoidimaging system complexity

Core Design Contradiction:

Manufacturing precisionVSDevice complexity

Solution Approach 1:

The patent changes the imaging parameters (resolution, sampling pattern application) selectively based on the area type. For solid areas, higher resolution with sampling pattern is applied to reduce trailing edge voids. For halftone areas, standard imaging without sampling pattern is used. This parameter differentiation achieves the desired effect while managing system complexity.

Inventive Principle:

Principle #35Parameter changes

Data Source

PatentUS20250208514A1Method for imaging a mask layer with two imaging settings and associated imaging system

Publication Date: 2025.06.26 XSYS PREPRESS NV

AI summary

A method for imaging a mask layer includes providing a mask layer, receiving an image file and detecting at least one solid area and at least one halftone area in the image file, imaging an area of the mask layer corresponding to the at least one solid area, using a first imaging setting, wherein prior to or during the imaging a sampling pattern is superimposed on pixels of the at least one solid area, so that only a portion of the pixels of the at least one solid area is imaged, and imaging an area of the mask layer corresponding to said at least one halftone area, using a second imaging setting which is different from the first imaging setting.