Deposition Mask Inspection for OLED Defect Detection

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Solution Overview

Problem

The increasing complexity of OLED displays requires deposition masks with multiple openings of different shapes, but existing inspection methods struggle to efficiently detect defects in these masks simultaneously.

Innovation Solution

A mask inspection apparatus and method that can inspect a deposition mask with openings of different shapes for defects by designating groups of openings, comparing images of these groups, and determining defectiveness based on the comparison.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Productivity

If conventional inspection methods are used for masks with multiple openings of different shapes, then inspection of each opening type must be performed separately, but this increases inspection time and reduces productivity

Engineering Contradiction:
Improveinspection efficiencyVSAvoidinspection time
Core Design Contradiction:
ProductivityVSLoss of time

Solution Approach 1:

The patent merges multiple inspection processes for different opening shapes into a single unified inspection method. The controller simultaneously inspects first openings and second openings with different shapes by capturing images and comparing them against respective reference images, eliminating the need for separate inspection processes and thereby improving productivity while reducing inspection time

Inventive Principle:
Principle #5Merging (Combining)

Solution Approach 2:

The inspection apparatus is designed with universal functionality to handle multiple types of openings (first openings and second openings with different shapes) using the same inspection system. The controller can selectively compare images of different opening types against their corresponding reference images, allowing one system to perform multiple inspection functions simultaneously

Inventive Principle:
Principle #6Universality (Multi-functionality)

2Measurement precision

If separate inspection processes are used for first openings and second openings, then each opening type can be inspected accurately, but the inspection process becomes complex and time-consuming

Engineering Contradiction:
Improvedefect detection accuracyVSAvoidinspection process complexity
Core Design Contradiction:
Measurement precisionVSDevice complexity

Solution Approach 1:

The patent combines multiple inspection processes into a single unified process where the controller simultaneously handles inspection of first openings and second openings. By integrating the comparison operations for different opening types into one coordinated process, the system maintains high defect detection accuracy while reducing process complexity and avoiding the need for separate inspection procedures

Inventive Principle:
Principle #5Merging (Combining)

3Device complexity

If a unified inspection method is used for all openings regardless of shape, then inspection process is simplified, but defect detection accuracy for different opening shapes may be compromised

Engineering Contradiction:
Improveinspection process simplicityVSAvoiddefect detection accuracy
Core Design Contradiction:
Device complexityVSMeasurement precision

Solution Approach 1:

The patent applies local quality by using shape-specific reference images for comparison. While the inspection process itself is unified and simple, the system maintains high precision for each opening type by comparing first openings against first reference images and second openings against second reference images. This allows the unified process to adapt locally to the specific shape requirements of each opening type, ensuring accurate defect detection without compromising precision

Inventive Principle:
Principle #3Local quality

Data Source

PatentUS12333706B2Mask inspection apparatus and method for inspecting a mask having first and second openings
Publication Date: 2025.06.17 SAMSUNG DISPLAY CO LTD
  • US12333706B2 patent drawing
  • US12333706B2 patent drawing
  • US12333706B2 patent drawing

AI summary

A mask inspection method and a mask inspection apparatus for inspecting a deposition mask are provided. A mask inspection method includes: providing a deposition mask including a plurality of first openings and a plurality of second openings, each of the first openings having a shape in a plan view different from that of each of the second openings; designating a first group and a second group, each including at least one of the first openings and at least one of the second openings; comparing an image of the first group with an image of the second group; and determining whether the first group and the second group are defective, an arrangement of the first and second openings of the first group being the same as an arrangement of the first and second openings of the second group.