Mask Manufacturing Using Laser Ablation

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Solution Overview

Problem

The existing methods for manufacturing masks, particularly for large-area applications, are inefficient due to the need for multistage photolithography processes, which reduce process efficiency and are not suitable for producing large-area masks.

Innovation Solution

A method involving a base substrate with light-absorbing layer patterns and a reflective layer, where the reflective patterns are formed by partially removing the reflective layer using laser irradiation, eliminating the need for photolithography processes and allowing for easier manufacturing of large-area masks.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If multistage photolithography processes are used to manufacture masks, then manufacturing precision can be achieved, but device complexity and loss of time increase significantly

Engineering Contradiction:

Improvemask pattern precisionVSAvoidmanufacturing process complexity

Core Design Contradiction:

Manufacturing precisionVSDevice complexity

Solution Approach 1:

The patent extracts and eliminates the photolithography process steps from the mask manufacturing workflow. By using direct laser writing to pattern the mask layer, the complex multistage photolithography process (including photoresist coating, exposure, development, and etching) is removed entirely, retaining only the essential patterning function while drastically simplifying the overall manufacturing process

Inventive Principle:

Principle #2Taking out (Extraction)

Solution Approach 2:

The patent replaces the mechanical/chemical photolithography system with an optical direct-writing system. Instead of using photoresist chemicals and multiple processing stages, the invention uses laser beams to directly ablate or modify the mask material, substituting a complex mechanical-chemical process with a more efficient optical process that achieves the same patterning result in fewer steps

Inventive Principle:

Principle #28Mechanics substitution (Replace mechanical system)

2Manufacturing precision

If multistage photolithography processes are used to manufacture masks, then manufacturing precision can be achieved, but productivity decreases due to multiple processing steps

Engineering Contradiction:

Improvemask pattern precisionVSAvoidmask manufacturing efficiency

Core Design Contradiction:

Manufacturing precisionVSProductivity

Solution Approach 1:

The patent merges multiple separate photolithography process steps into a single integrated laser writing operation. Functions that were previously distributed across coating, exposure, development, and etching stages are combined into one direct laser patterning step, reducing the total number of process stages and improving manufacturing throughput while maintaining pattern precision

Inventive Principle:

Principle #5Merging (Combining)

Solution Approach 2:

The patent performs preliminary preparation of the mask layer (such as applying a suitable material coating) in advance, so that the subsequent laser writing process can directly create the final pattern without requiring intermediate photolithography steps. This preliminary preparation enables the laser to directly pattern the mask material, eliminating the need for photoresist and multiple processing stages

Inventive Principle:

Principle #10Preliminary action

3Reliability

If conventional mask manufacturing methods are used, then transmissive and non-transmissive regions can be formed, but material loss increases due to photoresist coating and etching processes

Engineering Contradiction:

Improvemask functional performanceVSAvoidmask material loss

Core Design Contradiction:

ReliabilityVSLoss of substance

Solution Approach 1:

The patent converts the potentially harmful laser energy (which could cause unwanted material modification) into a beneficial direct patterning tool. By carefully controlling laser parameters and selecting appropriate mask materials, the laser energy is used to precisely remove or modify only the intended regions, creating the pattern directly without the material loss associated with photoresist waste and etching byproducts

Inventive Principle:

Principle #22Blessing in disguise (Convert harm into benefit)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach simplifies the mask manufacturing process, improves efficiency, and enables the production of large-area masks by reducing material loss and omitting additional processing steps, such as photoresist coating and etching.

Implementation Method 1

The providing the reflective patterns includes removing the light-absorbing layer patterns and a portion of the reflective layer, by irradiating the light-absorbing layer patterns with laser light

Methodology Applied

Scientific EffectLaser irradiation: Laser

Implementation Method 2

providing a base substrate including light-absorbing layer patterns on a first surface thereof

Methodology Applied

Scientific EffectLight absorption: Absorption (EM radiation)

Data Source

PatentUS9170484B2Mask and method of manufacturing the same

Publication Date: 2015.10.27 SAMSUNG DISPLAY CO LTD

AI summary

A method of manufacturing a mask includes: providing a base substrate including light-absorbing layer patterns on a first surface thereof; providing a reflective layer on the light-absorbing layer patterns and the first surface of the base substrate; and providing reflective patterns by partially removing the reflective layer. The providing the reflective patterns includes removing the light-absorbing layer patterns and a portion of the reflective layer, by irradiating the light-absorbing layer patterns with laser light.