Automated Mask Layout Design Rule Correction
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
The increasing complexity of semiconductor design and manufacturing processes, particularly with advanced nanometer processes, leads to significant challenges in correcting geometrical design rule violations manually, which is time-consuming and can delay production due to the numerous dependencies and complex design rules involved.
Innovation Solution
An automated system utilizing a design rule auto-correction tool and artificial intelligence convolutional neural networks to analyze mask layout data, identify, and automatically correct design rule violations, including dependencies, by adjusting feature dimensions and repositioning polygons to match defined manufacturing rules, thereby maintaining electrical connectivity and manufacturing structural correctness.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If manual correction of design rule violations is performed by layout designers, then design rule violations can be identified and corrected, but the correction process becomes time-consuming and delays production due to the need to iteratively fix violations and consider design rule dependencies
Solution Approach 1:
The system enables self-service by implementing an automated design rule correction system that independently identifies violations, analyzes dependencies, and applies corrections without requiring manual layout designer intervention. The automated system serves itself by maintaining the mask layout electrical connectivity and reliability verification throughout the correction process, eliminating the time-consuming iterative manual correction cycle while ensuring design rule compliance.
2Adaptability or versatility
If the number of transistors and layers in semiconductor devices is increased to improve functionality, then device capability is enhanced, but the complexity of design rules and the difficulty of correction significantly increase
Solution Approach 1:
The system introduces an intermediary automated correction system that mediates between the complex design rules and the mask layout. This intermediary analyzes design rule dependencies, coordinates corrections across multiple layers and transistors, and ensures that corrections in one area do not create new violations elsewhere. The intermediary maintains electrical connectivity and reliability verification throughout the correction process, managing the complexity introduced by increased device functionality.
3Manufacturing precision
If manual correction processes are used for advanced nanometer processes with highly complex design rules, then design accuracy can be maintained, but production time is significantly extended by many months
Solution Approach 1:
The system replaces the mechanical manual correction process with an automated computational system. Instead of relying on layout designers to manually identify and correct design rule violations, the automated system uses algorithms to analyze mask layout data, detect violations, and apply corrections. This substitution maintains design rule accuracy through systematic analysis while dramatically increasing production speed by eliminating the time-consuming manual iteration process that previously extended production by many months.
4Reliability
If iterative correction of design rule violations is performed to ensure compliance, then design correctness is improved, but the overall design time increases significantly
Solution Approach 1:
The system performs preliminary action by proactively analyzing design rule dependencies before corrections are applied. The automated system identifies potential violations and their interdependencies in advance, plans the correction sequence to prevent new violations, and applies corrections in an optimized order. This preliminary analysis ensures design correctness is maintained while reducing the need for repeated iterative corrections, thereby significantly reducing overall design time compared to traditional manual iterative approaches.
Data Source
AI summary
Computer-implemented systems and methods for eliminating geometrical design rule violations, maintaining mask layout electrical connectivity, reliability verification, and design for manufacturing structural correctness of a mask layout block are provided. Exemplary systems and methods include comparing a feature dimension in a mask layout data file with a design rule in a reference rule file and identifying a design rule violation of a mask layout block if the feature dimension does not match the design rule. Methods may further include automatically correcting the design rule violation by modifying the feature dimension so the feature dimension matches the design rule. A design rule auto-correction tool may be provided and be configured to compare a feature dimension in a mask layout data file with a design rule in a reference rule file and correct the design rule violation. Disclosed embodiments advantageously correct all design rules including dependency rules.