Mask Pattern Frequency Control for Ink Jet Printing

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Solution Overview

Problem

Ink jet printing systems face issues with granularity and uneven density due to interference between dot arrangement patterns and mask patterns during multi-pass printing, leading to visible streaks and texture in printed images.

Innovation Solution

A data processing apparatus and method that uses mask patterns with specific frequency characteristics, where the logical product pattern of print permitting pixels and dot arrangement patterns has fewer low-frequency components and no peaks in the low-frequency region, to reduce interference and enhance dispersibility of dots across multiple scans.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If conventional mask patterns are used in multi-pass printing, then printing can be performed multiple times to improve image quality, but interference between dot arrangement patterns and mask patterns causes granularity and uneven density

Engineering Contradiction:
Improveimage qualityVSAvoidgranularity and uneven density
Core Design Contradiction:
Manufacturing precisionVSObject-generated harmful factors

Solution Approach 1:

The patent changes the frequency parameters of the mask pattern by designing it to have fewer low-frequency components and no peaks in the low-frequency region. This parameter modification reduces the interference between the mask pattern and dot arrangement pattern, thereby reducing granularity and uneven density while maintaining multi-pass printing capabilities for improved image quality

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The patent introduces a new dimension of analysis by examining the frequency spectrum of mask patterns. By transforming the mask pattern into the frequency domain and controlling the distribution of frequency components (specifically reducing low-frequency components and eliminating peaks), the patent achieves better compatibility with dot arrangement patterns, resolving the interference issue that manifests as granularity and uneven density in the spatial domain

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

2Manufacturing precision

If dot arrangement patterns are used to control printing, then printing precision can be improved, but interference with mask patterns creates visible streaks and texture

Engineering Contradiction:
Improveprinting precisionVSAvoidvisible streaks and texture
Core Design Contradiction:
Manufacturing precisionVSObject-generated harmful factors

Solution Approach 1:

The patent modifies the frequency parameters of the mask pattern to reduce interference with dot arrangement patterns. By ensuring the mask pattern has fewer low-frequency components and no peaks in the low-frequency region, the patent minimizes the interaction that produces visible streaks and texture, thereby maintaining printing precision while eliminating harmful visual artifacts

Inventive Principle:
Principle #35Parameter changes

3Stability of the object's composition

If mask patterns with high dispersibility are used, then dot distribution can be improved, but low-frequency components cause interference with dot arrangement patterns

Engineering Contradiction:
Improvedot distribution uniformityVSAvoidinterference with dot arrangement
Core Design Contradiction:
Stability of the object's compositionVSObject-generated harmful factors

Solution Approach 1:

The patent optimizes the frequency spectrum of the mask pattern by controlling the distribution of frequency components. Specifically, it reduces the number of low-frequency components and eliminates peaks in the low-frequency region, while maintaining adequate dispersibility of dots. This parameter optimization achieves uniform dot distribution without interfering with the dot arrangement pattern, as the modified frequency content prevents resonant interactions that would cause visible defects

Inventive Principle:
Principle #35Parameter changes

Data Source

PatentUS7506950B2Data processing apparatus, printing apparatus and method of creating mask pattern
Publication Date: 2009.03.24 CANON KK
  • US7506950B2 patent drawing
  • US7506950B2 patent drawing
  • US7506950B2 patent drawing

AI summary

A data processing apparatus includes a mask processor for performing a mask process for binary data, which is obtained by a binarization process using a dot arrangement pattern, by using mask patterns having print permitting pixels to generate binary data used for each of a plurality of scans of a print head to a same area of a print medium. A logical product pattern obtained by a logical product operation of an arrangement pattern of the print permitting pixels in at least one of the mask patterns and the dot arrangement pattern satisfies the characteristics of (a) frequency components of a low frequency region are fewer than that of a high frequency region, and (b) peaks of the frequency components do not exist in a region lower side of half of the low frequency region.