Mask Pattern Verification Using Inscribed Figure Area Difference
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Solution Overview
Problem
Current semiconductor manufacturing processes face challenges in accurately verifying and correcting mask patterns post-lithography, particularly in ensuring that resist patterns match designed layout patterns, due to scattering and interference of exposure light, which affects the shape and area of lithographic features.
Innovation Solution
A method involving a mask pattern verification device with an inscribed figure calculation unit, differential calculation unit, and specification determination unit, which calculates the difference in area between the designed layout data and the lithographic shape, and adjusts auxiliary patterns to ensure the area difference meets specifications, thereby correcting the mask pattern to achieve a circular or oval shape.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If auxiliary patterns are added to the mask pattern to improve lithographic shape, then the manufacturing precision of the resist pattern is improved, but the device complexity of the mask pattern verification process increases
Solution Approach 1:
The patent applies preliminary action by calculating the inscribed figure and determining the required area difference before actual mask pattern fabrication. The verification process pre-calculates the relationship between auxiliary pattern areas and lithographic shape accuracy, allowing optimization to be performed beforehand rather than through trial-and-error after manufacturing.
Solution Approach 2:
The patent replaces complex physical trial-and-error mask fabrication and testing with computational calculations. The inscribed figure calculation unit and differential calculation unit use mathematical models to predict lithographic outcomes, substituting physical experimentation with computational analysis to reduce verification complexity.
2Manufacturing precision
If the mask pattern is corrected by adjusting auxiliary patterns to match designed layout, then the manufacturing precision is improved, but the loss of time in the verification and correction process increases
Solution Approach 1:
The verification process performs all necessary calculations including inscribed figure determination and area difference computation before mask pattern fabrication. By pre-calculating the optimal auxiliary pattern configurations and verifying them virtually, the patent eliminates iterative physical testing and correction cycles that would consume significant time.
Solution Approach 2:
The patent creates a virtual copy of the mask pattern through computational modeling and simulation. The inscribed figure and lithographic shape calculations produce a digital representation that can be analyzed and corrected without physical manipulation, allowing rapid verification and optimization before actual manufacturing.
3Measurement precision
If the verification process calculates the inscribed figure and area difference to ensure specification compliance, then the measurement precision of lithographic shape is improved, but the device complexity of the verification system increases
Solution Approach 1:
The verification system is segmented into distinct functional units: an inscribed figure calculation unit that determines the reference geometry, a differential calculation unit that computes area differences, and a specification determination unit that validates compliance. This modular segmentation allows each unit to perform a specific calculation task independently, improving measurement precision while managing system complexity through functional decomposition.
Solution Approach 2:
The patent replaces complex physical measurement systems with computational calculations. Instead of using sophisticated physical instruments to measure lithographic shapes, the system uses mathematical models to calculate inscribed figures and area differences, achieving high measurement precision through computation rather than physical measurement hardware.
Data Source
AI summary
According to one embodiment, an inscribed figure as circle or an oval inscribed in a rectangular pattern of designed layout data is calculated, a difference in area between a lithographic shape corresponding to the rectangular pattern and the inscribed figure is calculated, and it is determined whether the difference in area satisfies a predetermined specification.