Mask Pattern Generation from Seed Vectors via Lookup Tables
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Solution Overview
Problem
Current memory systems face inefficiencies in generating mask patterns from seed vectors, leading to significant overhead in time and power consumption, especially when performing sequential arithmetical, shift, and logical operations across large memory arrays.
Innovation Solution
The generation of mask patterns from seed vectors by performing selected logical operations and shift operations, allowing for the creation of vector elements with various bit intervals, which define the boundaries and scope of operations within memory cells, thereby reducing unnecessary data access and processing.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If mask patterns are generated by performing sequential arithmetical, shift, and logical operations on seed vectors, then the mask patterns can be accurately generated, but significant overhead in time and power consumption occurs
Solution Approach 1:
The patent pre-calculates and stores lookup tables (LUTs) containing the results of arithmetical, shift, and logical operations for all possible seed vector combinations. During actual mask pattern generation, the system simply queries these pre-computed tables rather than performing the full sequence of operations, thereby eliminating the time overhead while maintaining generation accuracy
Solution Approach 2:
The patent creates simplified copies of the complex operation sequences by storing their results in lookup tables. Instead of executing the full computational sequence each time, the system copies the pre-computed results from memory, dramatically reducing processing time while preserving the accuracy of the mask pattern generation
2Manufacturing precision
If mask patterns are generated by performing sequential arithmetical, shift, and logical operations on seed vectors, then the mask patterns can be accurately generated, but significant power consumption occurs
Solution Approach 1:
The patent pre-calculates and stores lookup tables (LUTs) containing the results of arithmetical, shift, and logical operations for all possible seed vector combinations. During actual mask pattern generation, the system simply queries these pre-computed tables rather than performing the full sequence of operations, thereby eliminating the power overhead while maintaining generation accuracy
Solution Approach 2:
The patent creates simplified copies of the complex operation sequences by storing their results in lookup tables. Instead of executing the full computational sequence each time, the system copies the pre-computed results from memory, dramatically reducing power consumption while preserving the accuracy of the mask pattern generation
3Ease of operation
If data is accessed and processed sequentially across memory arrays, then operations can be performed, but efficiency is reduced due to repeated data loading and processing
Solution Approach 1:
The patent combines multiple sequential operations (data loading, arithmetical operations, shift operations, logical operations, and mask pattern generation) into a single integrated lookup table query operation. By merging these separate processing steps into one unified operation, the system eliminates repeated data loading and processing, thereby maintaining operational ease while dramatically improving productivity
Solution Approach 2:
The patent pre-computes and stores the results of entire operation sequences in lookup tables before runtime. This preliminary action allows the system to execute operations by simple table lookup rather than sequential processing, eliminating the inefficiency of repeated data loading while preserving the completeness of the operation execution
Data Source
AI summary
The present disclosure includes apparatuses and methods related to mask patterns generated in memory from seed vectors. An example method includes performing operations on a plurality of data units of a seed vector and generating, by performance of the operations, a vector element in a mask pattern.