Mask-Robust Image Inpainting for Imperfect Object Masks

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Solution Overview

Problem

Conventional image inpainting systems suffer from inaccuracies and inflexibilities due to their reliance on precise masks, leading to unrealistic and imprecise inpainted content when dealing with imperfect masks.

Innovation Solution

A mask-robust image inpainting system that utilizes machine-learning models trained with real-world datasets of imperfect masks, allowing for the generation of pseudo-ground-truth inpainted images and detection of leftover artifacts to refine inpainting results.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Measurement precision

If conventional inpainting systems use precise mask requirements, then inpainting accuracy is improved, but ease of operation deteriorates

Engineering Contradiction:
Improveinpainting accuracyVSAvoidease of operation
Core Design Contradiction:
Measurement precisionVSEase of operation

Solution Approach 1:

The system changes the parameter of mask precision requirements by training the inpainting model on imperfect masks, allowing the model to learn robustness to mask imperfections while maintaining high inpainting accuracy

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The system uses a leftover artifacts detection model that provides feedback about residual artifacts after inpainting, enabling iterative refinement to improve accuracy without requiring perfect initial masks

Inventive Principle:
Principle #23Feedback

2Manufacturing precision

If conventional inpainting systems require accurate masks, then inpainting precision is improved, but adaptability deteriorates

Engineering Contradiction:
Improveinpainting precisionVSAvoidadaptability
Core Design Contradiction:
Manufacturing precisionVSAdaptability or versatility

Solution Approach 1:

The system changes the parameter of mask quality requirements by training on imperfect masks, enabling the model to adapt to various mask qualities while maintaining consistent inpainting precision across different scenarios

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The inpainting model becomes universal by handling both perfect and imperfect masks, as well as different types of artifacts, making it versatile for real-world applications where mask quality varies

Inventive Principle:
Principle #6Universality (Multi-functionality)

3Device complexity

If conventional inpainting systems use simple processing, then device complexity is reduced, but inpainting accuracy deteriorates

Engineering Contradiction:
Improvedevice complexityVSAvoidinpainting accuracy
Core Design Contradiction:
Device complexityVSMeasurement precision

Solution Approach 1:

The system segments the inpainting process into multiple specialized components: an inpainting model for filling gaps, a leftover artifacts detection model for identifying residual artifacts, and an iterative refinement process, with each component optimized for its specific function to achieve high overall accuracy

Inventive Principle:
Principle #1Segmentation

4Measurement precision

If conventional inpainting systems require multiple user interactions, then inpainting accuracy is improved, but productivity deteriorates

Engineering Contradiction:
Improveinpainting accuracyVSAvoidproductivity
Core Design Contradiction:
Measurement precisionVSProductivity

Solution Approach 1:

The system performs self-service by automatically detecting leftover artifacts and iteratively refining the inpainting results without requiring user intervention, maintaining high accuracy while improving productivity through automation

Inventive Principle:
Principle #25Self-service

Solution Approach 2:

The automatic artifact detection model provides continuous feedback about residual artifacts, enabling the system to self-correct and refine results iteratively without user input, achieving both high accuracy and efficiency

Inventive Principle:
Principle #23Feedback

Data Source

PatentUS12536626B2Mask-robust image inpainting utilizing machine-learning models
Publication Date: 2026.01.27 ADOBE INC
  • US12536626B2 patent drawing
  • US12536626B2 patent drawing
  • US12536626B2 patent drawing

AI summary

The present disclosure relates to systems, non-transitory computer-readable media, and methods for inpainting digital images utilizing mask-robust machine-learning models. In particular, in one or more embodiments, the disclosed systems obtain an initial mask for an object depicted in a digital image. Additionally, in some embodiments, the disclosed systems generate, utilizing a mask-robust inpainting machine-learning model, an inpainted image from the digital image and the initial mask. Moreover, in some implementations, the disclosed systems generate a relaxed mask that expands the initial mask. Furthermore, in some embodiments, the disclosed systems generate a modified image by compositing the inpainted image and the digital image utilizing the relaxed mask.