Vacuum-Resistant Mask-Shaped Measuring Apparatus

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Solution Overview

Problem

In semiconductor manufacturing, the exposure process in vacuum chambers, especially EUV exposure, faces challenges in accurately measuring physical properties due to vacuum conditions, plasma, and high-energy light, which affects productivity and yield.

Innovation Solution

A measuring apparatus with a body shaped like an exposure mask, equipped with a measuring element and protective layers, is designed to withstand vacuum conditions and accurately measure physical properties like temperature, electric fields, and light characteristics in real-time within the vacuum chamber, using a structure similar to existing exposure masks and electrostatic chucks.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Measurement precision

If a measuring apparatus is placed in a vacuum chamber to measure physical properties, then measurement capability is improved, but the apparatus may suffer from physical deformation due to vacuum pressure

Engineering Contradiction:
Improvemeasurement capabilityVSAvoidphysical deformation
Core Design Contradiction:
Measurement precisionVSStability of the object's composition

Solution Approach 1:

The measuring apparatus is divided into a measurement unit and a support structure. The support structure includes a back plate and side walls that segment the internal space, providing structural reinforcement against vacuum pressure while the measurement unit remains functional.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The apparatus uses composite construction with a body made of vacuum-resistant material and a protective layer made of different material properties. This composite structure provides both mechanical strength to withstand vacuum and protection for the measuring elements.

Inventive Principle:
Principle #40Composite materials

2Stability of the object's composition

If the measuring apparatus is designed to withstand vacuum conditions, then structural stability is improved, but the complexity of the apparatus increases

Engineering Contradiction:
Improvestructural stabilityVSAvoidapparatus complexity
Core Design Contradiction:
Stability of the object's compositionVSDevice complexity

Solution Approach 1:

The body structure serves multiple functions: it contains the measuring elements, provides structural strength against vacuum, and forms the protective enclosure. This multi-functionality reduces the need for separate components, thereby reducing overall complexity despite the vacuum-resistant design.

Inventive Principle:
Principle #6Universality (Multi-functionality)

Solution Approach 2:

The apparatus uses a thin-walled body structure with optimized geometry that provides sufficient structural strength against vacuum pressure without requiring thick, heavy walls. The side walls and back plate form a lightweight yet robust enclosure.

Inventive Principle:
Principle #30Flexible shells and thin films

3Productivity

If real-time measurement is implemented in the vacuum chamber, then process control capability is improved, but the reliability of the measuring apparatus under vacuum conditions deteriorates

Engineering Contradiction:
Improveprocess control capabilityVSAvoidreliability under vacuum
Core Design Contradiction:
ProductivityVSReliability

Solution Approach 1:

The measuring apparatus is designed as a disposable or replaceable component that can be easily installed and removed from the vacuum chamber. This allows the measurement unit to be optimized for measurement performance without excessive concern for long-term vacuum durability, as it can be replaced if needed.

Inventive Principle:
Principle #27Cheap short-living objects (Disposable)

Solution Approach 2:

The body structure acts as an intermediary between the vacuum environment and the measuring elements. It provides a protected internal environment for the measuring components while maintaining the vacuum seal, thereby protecting sensitive measuring elements from direct vacuum exposure.

Inventive Principle:
Principle #24Intermediary (Mediator)

Data Source

PatentUS11169449B2Measuring apparatus for vacuum chamber and measuring system including the same
Publication Date: 2021.11.09 SAMSUNG ELECTRONICS CO LTD
  • US11169449B2 patent drawing
  • US11169449B2 patent drawing
  • US11169449B2 patent drawing

AI summary

A measuring apparatus for a vacuum chamber capable of accurately measuring physical properties or quantities in the vacuum chamber in an exposure process in real time, and a measuring system including the measuring apparatus are described herein. The measuring apparatus includes: a body having a shape of an exposure mask used in an exposure process; and a measuring element in an interior of the body or on a first surface of the body. When the measuring apparatus is positioned in a vacuum chamber during the exposure process, the measuring apparatus is configured to measure physical properties in the vacuum chamber using the measuring element. The body or the measuring element is configured to withstand a vacuum in the vacuum chamber including resisting or preventing physical deformation of the body or the measuring element due to the vacuum.