Mask Sheet Pattern Formation Using Auxiliary Sheet Tension
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Solution Overview
Problem
Conventional methods for forming mask patterns in organic electroluminescent displays result in non-uniform stiffness, leading to bending or deflection of the mask out of plane during organic material layer deposition, which complicates the formation of precise patterns.
Innovation Solution
A method involving the uniform application of tension to a mask pattern area by using an auxiliary sheet with greater thickness or incorporating holes in the mask sheet to distribute tension evenly, and forming patterns spirally to prevent bending or deflection, ensuring consistent stiffness across the mask.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Stability of the object's composition
If tension is applied to the mask to secure it on the mask frame, then the mask is fixed in position, but the mask bends or deflects out of plane due to non-uniform stiffness
Solution Approach 1:
The mask sheet is divided into a pattern area and a mask attaching portion, with the attaching portion having reduced stiffness through hole formation. This segmentation allows different regions to serve different functions: the pattern area maintains stiffness for precise pattern formation, while the attaching portion accommodates tension without deflecting the overall mask plane.
Solution Approach 2:
The mask sheet exhibits non-uniform stiffness distribution, with the mask attaching portion having lower stiffness due to holes while the pattern area maintains higher stiffness. This local quality differentiation enables the mask to be secured under tension while preventing bending in the critical pattern area, resolving the contradiction between position stability and planarity.
2Productivity
If the mask pattern is formed by moving the pattern forming device across the mask sheet, then the pattern is efficiently created, but non-uniform tension causes distortion in the formed pattern
Solution Approach 1:
By segmenting the mask sheet into pattern area and mask attaching portion with different stiffness characteristics, the invention enables efficient pattern formation across the entire mask while preventing tension-induced distortion in the pattern area, thus maintaining both productivity and manufacturing precision.
Solution Approach 2:
The local quality differentiation in stiffness allows the mask to accommodate tension in the attaching portion without transmitting distortion to the pattern area, ensuring high pattern accuracy while maintaining efficient pattern formation processes.
3Weight of moving object
If the mask sheet is made thinner to reduce weight, then the device is lighter, but the mask becomes more prone to bending under tension
Solution Approach 1:
The invention allows the mask sheet to have locally reduced stiffness in the mask attaching portion through hole formation, enabling the use of thinner material that is sufficient for weight reduction while the pattern area maintains adequate stiffness to resist bending under tension.
Solution Approach 2:
By segmenting the mask sheet into regions with different thickness or stiffness requirements, the invention enables weight optimization in the attaching portion while maintaining structural integrity and bending resistance in the critical pattern area.
Data Source
AI summary
Disclosed is a method of forming a pattern on a mask sheet including an attaching portion to be attached to a mask frame, and a pattern area in which the pattern is formed. The method includes positioning the mask sheet on an auxiliary sheet with a thickness greater than the thickness of the mask sheet, fastening the auxiliary sheet to the mask frame, applying a stretching force to the mask sheet and the auxiliary sheet, and forming the pattern on the pattern area of the mask sheet. Thus, a predetermined pattern is formed on a mask sheet while a uniformly distributed external force is applied to the mask sheet, so that bending or deflecting out of plane by the mask sheet is prevented, thereby forming a precise mask pattern.