Pattern Phase Difference Film Production via Mask Slit Design
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Solution Overview
Problem
Current methods for producing pattern phase difference films for passive-type 3D displays face challenges in mass production due to the use of expensive glass substrates and time-consuming laser machining, making it difficult to achieve high accuracy and efficiency.
Innovation Solution
A method involving a mask with slits of gradually decreasing width in the longitudinal direction is used to form a patterned phase difference film on an elongated transparent film, allowing for high-speed processing and accurate exposure during the photo-alignment process, enabling mass production of patterned phase difference films with high accuracy.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If glass substrate and laser machining are used to produce pattern phase difference film, then manufacturing precision is improved, but productivity deteriorates due to time-consuming processes and high costs
Solution Approach 1:
The patent replaces the mechanical laser machining process with a photo-alignment film formation process using UV irradiation through a mask. This substitution eliminates the time-consuming laser scanning while maintaining pattern accuracy, enabling high-speed mass production of pattern phase difference films.
Solution Approach 2:
The patent uses a mask to create a copy of the desired pattern structure directly onto the photo-alignment film through UV irradiation. This copying method is much faster than laser machining and allows for rapid reproduction of patterns across large areas, significantly improving productivity.
2Manufacturing precision
If laser scanning is used to irradiate the entire circumference of the roll plate, then manufacturing precision is improved, but loss of time increases due to the lengthy irradiation process
Solution Approach 1:
The patent prepares a mask with the complete pattern design beforehand, allowing all exposure areas to be irradiated simultaneously in one pass. This preliminary preparation eliminates the sequential scanning process, dramatically reducing manufacturing cycle time while maintaining exposure accuracy through the precisely designed mask slits.
Solution Approach 2:
The patent enables continuous UV irradiation across the entire roll plate surface through the mask, eliminating the start-stop nature of laser scanning. This continuous exposure process maintains high precision while significantly reducing the total time required for manufacturing.
3Manufacturing precision
If expensive laser machining apparatus is used, then manufacturing precision is improved, but device complexity and cost increase
Solution Approach 1:
The patent replaces the expensive, complex laser machining apparatus with a simple mask that can be easily manufactured and replaced. The mask serves as a disposable or reusable template that defines the pattern, eliminating the need for costly laser equipment while maintaining high pattern formation accuracy.
Solution Approach 2:
The patent introduces a mask as an intermediary element between the UV light source and the photo-alignment film. This simple intermediary component achieves precise pattern formation without requiring complex laser machining apparatus, significantly reducing device complexity and cost.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach simplifies and enhances the mass production of patterned phase difference films with high accuracy, reducing production time and costs while maintaining exposure precision, even when processing at high speeds.
Implementation Method 1
forming an alignment film by performing an exposure process on the photo-alignment material film by using a mask through a photo-alignment method
Data Source
AI summary
The present invention pertains to a pattern phase difference film, which is used to display 3D images using a passive system, and provides a method for producing a pattern phase difference film that can be manufactured with high precision, easily and in large quantities. In a mask provided for manufacturing an alignment film, slits, which are provided for exposure treatment, are made so as to gradually narrow toward the ends in the longitudinal direction.