Mask Stage Height Adjustment for Deposition Flatness Control
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Solution Overview
Problem
Existing deposition technologies face challenges in achieving pixel-per-accuracy (PPA) due to mask deformation during the deposition process, which affects the precision of forming pixels on display devices such as LCDs and OLEDs.
Innovation Solution
A mask stage with a frame and height adjustment blocks, including internal and external adjustment blocks connected to linear drivers, allows for real-time compensation of mask flatness, ensuring precise deposition by adjusting the mask's position and orientation.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a mask is used for deposition, then deposition coverage is improved, but mask deformation occurs affecting pixel-per-accuracy
Solution Approach 1:
The mask stage converts from a static structure to a dynamic one by incorporating multiple linear drivers that can independently adjust the position of support blocks. This allows the mask stage to adapt its shape in real-time during deposition, compensating for mask deformation and maintaining pixel-per-accuracy throughout the process.
Solution Approach 2:
The system changes the positional parameters of support blocks using linear drivers to compensate for mask deformation. By adjusting the height and position parameters of multiple support points, the system dynamically corrects mask flatness issues and maintains deposition accuracy.
2Manufacturing precision
If multiple height adjustment blocks are added, then mask flatness control is improved, but device complexity increases
Solution Approach 1:
The mask stage is segmented into multiple independent support blocks, each controlled by its own linear driver. This segmentation allows localized adjustment of different regions of the mask stage, enabling precise flatness control while keeping each control unit relatively simple and modular.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution enhances deposition accuracy by compensating for mask deformations, improving pixel formation precision and reducing distortions, rotations, and other transformation modes, thereby increasing the yield and quality of display devices.
Implementation Method 1
a plurality of linear drivers connected to the plurality of internal height adjustment blocks and the plurality of external height adjustment blocks
Implementation Method 2
Deposition technologies using large-area substrates and large-area masks may be used to improve yield
Data Source
AI summary
A mask stage includes a frame including an opening portion and an outer portion surrounding the opening portion, the outer portion including a first to fourth outer portions, disposed in a plane defined by a first direction and a second direction crossing the first direction, a plurality of internal height adjustment blocks disposed at the first to fourth outer portions, a plurality of external height adjustment blocks disposed at the first to fourth outer portions and disposed spaced apart from the opening portion with the plurality of internal height adjustment blocks disposed therebetween, and a plurality of linear drivers connected to the plurality of internal height adjustment blocks and the plurality of external height adjustment blocks.