Mask Assembly with Stopping Layer for Display Deposition
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Solution Overview
Problem
Current display device manufacturing processes face challenges in achieving consistent quality and durability due to complex and inefficient methods for creating mask assemblies, which affect the precision and reliability of deposition processes.
Innovation Solution
The proposed method involves a mask assembly with a stopping layer and an inorganic layer, where the stopping layer has openings that correspond to the inorganic layer openings, allowing for precise etching and deposition, ensuring identical shapes and selectivity ratios between the layers, thereby simplifying the manufacturing process and improving durability and quality.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a complex mask assembly manufacturing process is used, then the precision of mask openings may be improved, but the manufacturing complexity and time increase
Solution Approach 1:
The mask assembly is divided into distinct functional layers: a first mask layer for primary patterning, a stopping layer with openings for precise alignment, and an inorganic layer for protective etching. This segmentation allows each layer to be optimized independently for its specific function while simplifying the overall manufacturing process by eliminating the need for complex single-layer mask structures.
2Manufacturing precision
If multiple etching steps are performed, then the manufacturing precision of mask openings is improved, but the manufacturing time and process complexity increase
Solution Approach 1:
The stopping layer is pre-formed with openings at precise positions before the final mask pattern transfer. This preliminary action establishes the exact alignment positions in advance, allowing subsequent etching steps to proceed more quickly without compromising precision, as the alignment reference is already in place.
Solution Approach 2:
The stopping layer acts as an intermediary element between the first mask layer and the inorganic layer. It provides a stable intermediate structure with pre-formed openings that facilitates precise alignment and enables efficient single-step etching of the inorganic layer, reducing the total number of etching cycles required.
3Ease of manufacture
If the mask assembly structure is simplified, then the manufacturing process is easier and faster, but the durability and quality consistency may worsen
Solution Approach 1:
The mask assembly employs a composite structure combining organic mask materials with an inorganic protective layer. This composite construction provides both the ease of photolithographic patterning from the organic layers and the enhanced durability and etching resistance of the inorganic layer, ensuring quality consistency while maintaining manufacturing simplicity.
Solution Approach 2:
The inorganic layer is deposited beforehand to provide protective cushioning during the etching process. This pre-formed protective layer prevents damage to underlying structures and ensures consistent etching results, thereby maintaining reliability and quality consistency without complicating the manufacturing process.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enhances the manufacturing efficiency and consistency of display devices by ensuring precise alignment and etching of mask openings, leading to improved durability and quality of the final products.
Implementation Method 1
a deposition source arranged in the chamber, facing the mask assembly, and supplying a deposition material that passes through the mask assembly and is deposited on the display substrate
Implementation Method 2
forming an inorganic opening of the inorganic layer by etching the inorganic layer corresponding to the stopping layer opening
Data Source
AI summary
A method of manufacturing a display device includes arranging a display substrate in a chamber, arranging a mask assembly in the chamber, and supplying a deposition material to the mask assembly by a deposition source. The arranging of the mask assembly includes disposing a stopping layer including a stopping layer opening on a first mask layer, disposing an inorganic layer on the stopping layer, forming a first mask opening in the first mask layer, and forming an inorganic opening of the inorganic layer by etching the inorganic layer corresponding to the stopping layer opening.