Integrated Mask-Substrate Alignment Mechanism for Compact Film Forming
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Solution Overview
Problem
Conventional film forming devices require separate alignment mechanisms for substrates and masks, leading to increased device size and cost due to the need for both high-resolution and low-resolution alignment cameras, and mechanical challenges in transferring alignment marks accurately.
Innovation Solution
An alignment mechanism that integrates a substrate suctioner, mask supporter, temporary receiver, horizontal coarse movement stage, and vertical coarse movement stage to perform rough alignment without additional mechanisms, reducing device size and cost.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If separate alignment mechanisms are provided for substrate and mask, then alignment precision is improved, but device size and cost increase
Solution Approach 1:
The patent combines the substrate alignment mechanism and mask alignment mechanism into a single integrated alignment stage. The alignment stage includes a stage body that can hold either the substrate or the mask, and a positioning mechanism that adjusts the position of the held object. By merging the two separate mechanisms into one, the device size is reduced while maintaining the alignment precision required for both substrate and mask alignment.
2Manufacturing precision
If high-resolution alignment camera is used, then alignment precision is improved, but field of view is narrowed
Solution Approach 1:
The alignment process is divided into two distinct stages: rough alignment and fine alignment. The rough alignment stage uses a low-resolution camera with a wide field of view to bring the alignment mark within the field of view of the fine alignment camera. The fine alignment stage then uses the high-resolution camera to achieve precise alignment. This segmentation allows each camera to operate in its optimal range, combining the benefits of both wide field of view and high precision.
3Area of stationary object
If rough alignment camera with wide field of view is used, then field of view is improved, but alignment precision deteriorates
Solution Approach 1:
The alignment process is divided into two distinct stages: rough alignment and fine alignment. The rough alignment stage uses a low-resolution camera with a wide field of view to bring the alignment mark within the field of view of the fine alignment camera. The fine alignment stage then uses the high-resolution camera to achieve precise alignment. This segmentation allows each camera to operate in its optimal range, combining the benefits of both wide field of view and high precision.
4Manufacturing precision
If transport mechanism transfer accuracy is improved, then alignment precision is improved, but mechanical complexity increases
Solution Approach 1:
The patent introduces an alignment stage as an intermediary mechanism between the transport mechanism and the substrate/mask positioning system. The alignment stage includes a positioning mechanism that can adjust the position of the held object with high precision without requiring the transport mechanism itself to be highly complex. This intermediary allows the transport mechanism to remain simple while achieving the required transfer accuracy through the alignment stage's positioning capabilities.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables precise alignment operations while minimizing device size and cost by integrating coarse movement stages for both substrates and masks, allowing for efficient film formation accuracy without the need for separate alignment mechanisms.
Implementation Method 1
a substrate suctioner configured to hold the substrate
Data Source
AI summary
The alignment mechanism of the present disclosure is configured to adjust positions of a substrate and a mask, the alignment mechanism being characterized by including a substrate suctioner configured to suction and hold the substrate; a mask supporter configured to support the mask; a temporary receiver configured to temporarily support at least one of the substrate to be suctioned by the substrate suctioner and the mask to be placed on the mask supporter, the temporary receiver being provided at the mask supporter; a horizontal coarse movement stage mechanism that carries the mask supporter and the temporary receiver and moves the mask supporter and the temporary receiver within the horizontal plane; and a vertical coarse movement stage mechanism that raises and lowers the horizontal coarse movement stage mechanism.