Mask-Substrate Alignment Reset in Multi-Chamber Film Deposition
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Solution Overview
Problem
In substrate processing, positional shifts accumulate as substrates are conveyed between multiple film forming chambers, leading to misalignment and potential film formation issues, such as substrates protruding or falling, and realignment errors beyond the assumed range, which can stop the film formation process.
Innovation Solution
A substrate processing apparatus with a movable member that supports the mask or substrate within the film forming chamber, allowing for alignment error reduction before film formation and moving to a predetermined position before the substrate is taken out, thereby reducing positional shifts through position reset processing.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If a substrate is sequentially conveyed to multiple film forming chambers to form multiple films, then multiple functional layers can be formed on the substrate, but positional shifts of the substrate accumulate in each film forming chamber leading to alignment errors
Solution Approach 1:
The movable member performs preliminary alignment adjustment before film formation by detecting alignment errors between the substrate and mask, and moving the mask or substrate to correct the misalignment. This preliminary correction prevents accumulation of positional shifts from affecting subsequent film formation processes.
Solution Approach 2:
The system detects alignment errors between substrate and mask using alignment marks, and uses this feedback information to control the movable member's position adjustment. This closed-loop feedback mechanism ensures that alignment accuracy is maintained throughout multi-layer film formation by continuously correcting positional deviations.
2Manufacturing precision
If alignment between substrate and mask is performed in each film forming chamber, then film formation accuracy is improved, but the complexity of the alignment process increases
Solution Approach 1:
The movable member serves multiple functions: it positions the mask, positions the substrate, performs alignment adjustments, and enables film formation. By consolidating these functions into a single multi-functional component, the system achieves accurate alignment without proportionally increasing overall system complexity.
Solution Approach 2:
The alignment system uses alignment marks that are already present on the substrate and mask, and the movable member uses detection signals from these marks to automatically adjust positioning. This self-service alignment approach reduces the need for external complex alignment equipment and procedures.
3Productivity
If the substrate is conveyed through multiple chambers without position reset, then processing continuity is maintained, but alignment errors accumulate beyond the assumed range causing film formation to stop
Solution Approach 1:
Before each film formation process, the movable member performs preliminary position reset by detecting alignment errors and adjusting the mask or substrate position. This preliminary correction ensures that alignment errors do not accumulate beyond acceptable ranges, maintaining film formation stability throughout continuous multi-chamber processing.
Solution Approach 2:
The system proactively corrects alignment deviations before they accumulate to critical levels that would stop film formation. By continuously detecting and correcting positional shifts using the movable member and alignment marks, the system cushions against the accumulation of errors, ensuring reliable continuous processing.
Data Source
AI summary
A substrate processing apparatus includes a film forming chamber in which a film is formed on a substrate, and a movable member configured to support a mask or both the mask and the substrate in an internal space of the film forming chamber and be movable. Before the film is formed on the substrate, in a state in which the substrate conveyed to the internal space of the film forming chamber by a substrate conveying mechanism is separated from the mask supported by the movable member, the movable member moves so as to reduce an alignment error between the substrate and the mask and then supports the substrate. The movable member moves to a predetermined position after the substrate is supported by the movable member and before the substrate is taken out from the film forming chamber by the substrate conveying mechanism.